SCHEMBL11898561

SCHEMBL11898561

C=C(C)C(=O)OC(=O)c1ccnc(F)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TAS1R3 Q7RTX0 1/20 0.39
▸ TAS1R1 Q7RTX1 1/20 0.39
▸ TAS1R2 Q8TE23 1/20 0.39
▸ KDM4E B2RXH2 2/20 0.38
▸ KDM6B O15054 1/20 0.38
▸ KDM5C P41229 1/20 0.38
▸ KDM4C Q9H3R0 1/20 0.38
▸ KDM2A Q9Y2K7 1/20 0.38
▸ KDM3A Q9Y4C1 1/20 0.38
▸ ALOX15 P16050 1/20 0.35
▸ L3MBTL1 Q9Y468 1/20 0.35
▸ PFKFB3 Q16875 1/20 0.35
▸ JMJD6 Q6NYC1 7/20 0.34
▸ POLB P06746 1/20 0.34
▸ APEX1 P27695 1/20 0.34
▸ HTT P42858 1/20 0.34
▸ TDP1 Q9NUW8 1/20 0.34
▸ BRAF P15056 1/20 0.33
▸ PREP P48147 1/20 0.32
▸ FAP Q12884 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11898523 0.98 TAS1R3 (0.39) TAS1R3TAS1R1TAS1R2KDM4EKDM6B
SCHEMBL11899688 0.77 MAPT (0.36) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL10464528 0.77 KDM4E (0.60) TAS1R3TAS1R1TAS1R2KDM4EKDM6B
SCHEMBL30378469 0.77 KDM4E (0.60) TAS1R3TAS1R1TAS1R2KDM4EKDM6B
SCHEMBL11898510 0.77 HSD17B10 (0.48) KDM4EL3MBTL1POLBNPC1RAB9A
Methacrylic Acid SCHEMBL11898560 0.76 KDM4C (0.49) TAS1R3TAS1R1TAS1R2KDM4EKDM6B
SCHEMBL11898493 0.76 MAPT (0.35) KDM4EKDM6BKDM5CKDM4CKDM2A
SCHEMBL11899997 0.76 HSD17B10 (0.47) KDM4EL3MBTL1POLBNPC1RAB9A
SCHEMBL15922749 0.75 TAS1R3 (0.41) TAS1R3TAS1R1TAS1R2KDM4EKDM6B
SCHEMBL1437180 0.75 TAS1R3 (0.48) TAS1R3TAS1R1TAS1R2KDM4EKDM6B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120202153-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 — — US disclosed
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