Methacrylic Acid

Methacrylic Acid

SCHEMBL11898560

C=C(C)C(=O)O.O=C(O)c1ccnc(F)c1

nearest known ligand 0.49

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4C Q9H3R0 12/20 0.49
▸ KDM5B Q9UGL1 9/20 0.49
▸ KDM5A P29375 7/20 0.49
▸ KDM5C P41229 6/20 0.49
▸ KDM4A O75164 6/20 0.49
▸ KDM3A Q9Y4C1 5/20 0.49
▸ KDM4E B2RXH2 4/20 0.49
▸ KDM2A Q9Y2K7 4/20 0.49
▸ KDM6B O15054 3/20 0.49
▸ KDM4D Q6B0I6 2/20 0.49
▸ TET3 O43151 1/20 0.49
▸ BBOX1 O75936 1/20 0.49
▸ ALDH1A1 P00352 1/20 0.49
▸ MAPT P10636 1/20 0.49
▸ ASPH Q12797 1/20 0.49
▸ TET2 Q6N021 1/20 0.49
▸ ALKBH5 Q6P6C2 1/20 0.49
▸ KDM7A Q6ZMT4 1/20 0.49
▸ KDM8 Q8N371 1/20 0.49
▸ TET1 Q8NFU7 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29957382 0.88 KDM4C (0.61) KDM4CKDM5BKDM5AKDM5CKDM4A
SCHEMBL118817 0.88 KDM4C (0.61) KDM4CKDM5BKDM5AKDM5CKDM4A
Hydrochloric Acid SCHEMBL28045024 0.86 KDM4C (0.59) KDM4CKDM5BKDM5AKDM5CKDM4A
Nitrous Acid SCHEMBL29072872 0.81 KDM4C (0.53) KDM4CKDM5BKDM5AKDM5CKDM4A
SCHEMBL29967026 0.78 TAS1R3 (0.48) KDM4CKDM5BKDM5AKDM5CKDM4A
SCHEMBL15922749 0.78 TAS1R3 (0.41) KDM4CKDM5BKDM5AKDM5CKDM4A
SCHEMBL1437180 0.78 TAS1R3 (0.48) KDM4CKDM5BKDM5AKDM5CKDM4A
Methacrylic Acid SCHEMBL11898522 0.78 KDM5C (0.43) KDM4CKDM5BKDM5AKDM5CKDM4A
SCHEMBL11898561 0.76 TAS1R3 (0.39) KDM4CKDM5BKDM5AKDM5CKDM3A
Methacrylic Acid SCHEMBL11899692 0.75 KDM4C (0.44) KDM4CKDM5BKDM5AKDM5CKDM4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120202153-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 — — US disclosed
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