SCHEMBL11903599

SCHEMBL11903599

O=CC1CCCCC1C1CCCCC1

nearest known ligand 0.42

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
ADH1A P07327 3/20 0.32
ADH1C P00326 2/20 0.32
ADH1B P00325 1/20 0.32
ADH4 P08319 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13591076 1.00 ALDH1A1 (0.33) ALDH1A1ADH1AADH1CADH1BADH4
SCHEMBL1011943 0.95 ADH1A (0.33) ALDH1A1ADH1AADH1CADH4
SCHEMBL27716812 0.92 ADH1C (0.31) ADH1AADH1C
SCHEMBL9537517 0.90 ALDH1A1 (0.33) ALDH1A1
Trimethylammonium SCHEMBL28806004 0.87 ADH1A (0.39) ADH1AADH1CADH1BADH4
SCHEMBL9805832 0.85
SCHEMBL10472670 0.85
SCHEMBL30970515 0.82
SCHEMBL11903878 0.82 EPHX1 (0.31)
SCHEMBL8651378 0.80 ALDH1A1 (0.33) ALDH1A1ADH1AADH1CADH1BADH4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2487148-B1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2014-12-31 EP disclosed
US-8829247-B2 Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-09 US disclosed
US-20120251947-A1 CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-10-04 US disclosed
CN-102648173-A Cyclic compound, method for producing same, radiation sensitive composition, and method for forming resist pattern MITSUBISHI GAS CHEMICAL CO 2012-08-22 CN disclosed
EP-2487148-A1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-08-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120251947-A1 CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN MRE11, SLC11A2, CROCC ALDH1A1 4300/4885ADH1A 4004/4885ADH1C 3301/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.