SCHEMBL11908098

SCHEMBL11908098

O=C(OCOC1CCCCC1)C1CC2C=CC1C2

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.42
KMT2A Q03164 3/20 0.42
RAB9A P51151 1/20 0.42
LMNA P02545 2/20 0.41
KDM4E B2RXH2 2/20 0.41
POLB P06746 3/20 0.40
HSD17B10 Q99714 2/20 0.40
APEX1 P27695 1/20 0.40
RECQL P46063 1/20 0.40
BLM P54132 1/20 0.40
ESR2 Q92731 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
HPGD P15428 1/20 0.40
MAPK1 P28482 2/20 0.39
MAPT P10636 1/20 0.39
MEN1 O00255 1/20 0.34
ALOX15 P16050 1/20 0.34
TSHR P16473 1/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11907834 1.00 ALDH1A1 (0.42) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL11907611 0.99 ALDH1A1 (0.43) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL17192089 0.83 LMNA (0.52) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL11908819 0.81 ALDH1A1 (0.48) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL11908078 0.81 ALDH1A1 (0.48) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL947840 0.80 LMNA (0.46) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL20375290 0.80 LMNA (0.46) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL28630522 0.80 LMNA (0.46) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL11908671 0.80 LMNA (0.46) ALDH1A1KMT2ARAB9ALMNAKDM4E
SCHEMBL11908068 0.80 POLB (0.39) ALDH1A1KMT2ARAB9ALMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
US-20200264511-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2020-08-20 US disclosed
US-20200241419-A1 RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2020-07-30 US disclosed
US-8450440-B2 Method for purifying polymer and polymer MITSUI CHEMICALS, INC. (JP) 2013-05-28 US disclosed
US-20120208976-A1 METHOD FOR PURIFYING POLYMER AND POLYMER MITSUI CHEMICALS, INC (JP) 2012-08-16 US disclosed