SCHEMBL11921078

SCHEMBL11921078

CCCC[S+](CCCC)c1ccc2sc3ccccc3c2c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GPR3 P46089 1/20 0.42
▸ PTPN1 P18031 1/20 0.38
▸ CYP1A2 P05177 2/20 0.38
▸ ALDH1A1 P00352 6/20 0.37
▸ MAPT P10636 6/20 0.37
▸ RAB9A P51151 4/20 0.37
▸ HPGD P15428 2/20 0.37
▸ SMN1; SMN2 Q16637 1/20 0.37
▸ GABRP O00591 1/20 0.36
▸ GABRD O14764 1/20 0.36
▸ GABRA1 P14867 1/20 0.36
▸ GABRB1 P18505 1/20 0.36
▸ GABRG2 P18507 1/20 0.36
▸ GABRB3 P28472 1/20 0.36
▸ GABRA5 P31644 1/20 0.36
▸ GABRA3 P34903 1/20 0.36
▸ GABRA2 P47869 1/20 0.36
▸ GABRB2 P47870 1/20 0.36
▸ GABRA4 P48169 1/20 0.36
▸ GABRE P78334 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921106 0.85 KDM4E (0.38) MAPTKDM4ETSHR
SCHEMBL11921114 0.77 KMT2A (0.39) CYP1A2ALDH1A1MAPTRAB9ASMN1; SMN2
Dibenzothiophene SCHEMBL27524283 0.74 GPR3 (0.64) GPR3PTPN1ALDH1A1MAPTRAB9A
Hexadecane SCHEMBL27488634 0.74 GPR3 (0.64) GPR3PTPN1ALDH1A1MAPTRAB9A
Tridecane SCHEMBL8036309 0.74 GPR3 (0.64) GPR3PTPN1ALDH1A1MAPTRAB9A
Dibenzothiophene SCHEMBL27916373 0.74 GPR3 (0.64) GPR3PTPN1ALDH1A1MAPTRAB9A
SCHEMBL14798196 0.73 GPR3 (0.47) GPR3PTPN1CYP1A2ALDH1A1MAPT
SCHEMBL11921082 0.73 NPC1 (0.44) PTPN1CYP1A2ALDH1A1MAPTRAB9A
SCHEMBL14797740 0.72 RORA (0.46) GPR3PTPN1ALDH1A1KDM4ELMNA
Dibenzothiophene SCHEMBL232234 0.72 GPR3 (0.74) GPR3PTPN1CYP1A2ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9316911-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2016-04-19 — — US disclosed
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20130004741-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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