SCHEMBL11921082

SCHEMBL11921082

CCCC[S+](CCCC)c1ccc2oc3ccccc3c2c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 3/20 0.44
▸ MAPT P10636 3/20 0.44
▸ RAB9A P51151 2/20 0.44
▸ SMN1; SMN2 Q16637 2/20 0.44
▸ ALDH1A1 P00352 2/20 0.44
▸ KDM4E B2RXH2 1/20 0.44
▸ MEN1 O00255 1/20 0.44
▸ HPGD P15428 1/20 0.44
▸ KMT2A Q03164 1/20 0.44
▸ CYP1A2 P05177 2/20 0.43
▸ CYP2C19 P33261 2/20 0.43
▸ CYP2D6 P10635 1/20 0.43
▸ AHR P35869 2/20 0.40
▸ CYP3A4 P08684 1/20 0.40
▸ CYP2C9 P11712 1/20 0.40
▸ LMNA P02545 2/20 0.38
▸ PTPN1 P18031 2/20 0.38
▸ HTT P42858 1/20 0.38
▸ MAOA P21397 2/20 0.37
▸ GABRP O00591 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921078 0.73 GPR3 (0.42) NPC1MAPTRAB9ASMN1; SMN2ALDH1A1
SCHEMBL11921071 0.71 MAPT (0.54) MAPTSMN1; SMN2ALDH1A1KDM4EMEN1
Perchlorate SCHEMBL11657557 0.70 MAPT (0.47) NPC1MAPTRAB9ASMN1; SMN2ALDH1A1
SCHEMBL16806183 0.70 CYP1A2 (0.66) NPC1MAPTRAB9ASMN1; SMN2ALDH1A1
SCHEMBL16806176 0.70 LMNA (0.60) NPC1MAPTALDH1A1MEN1KMT2A
Dibenzofuran SCHEMBL28153003 0.70 SMN1; SMN2 (0.50) NPC1MAPTRAB9ASMN1; SMN2ALDH1A1
SCHEMBL20354331 0.69 CYP1A2 (0.66) NPC1MAPTRAB9ASMN1; SMN2ALDH1A1
SCHEMBL6481323 0.69 MAPT (0.46) NPC1MAPTRAB9ASMN1; SMN2ALDH1A1
SCHEMBL18174891 0.69 NPC1 (0.42) NPC1MAPTRAB9ASMN1; SMN2ALDH1A1
SCHEMBL3201160 0.68 LTA4H (0.38) SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9316911-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2016-04-19 — — US disclosed
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20130004741-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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