SCHEMBL11921095

SCHEMBL11921095

c1ccc(-n2c3ccccc3c3cc([S+]4CCCC4)ccc32)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ L3MBTL1 Q9Y468 2/20 0.55
▸ KDM4E B2RXH2 2/20 0.55
▸ ATM Q13315 1/20 0.55
▸ KDR P35968 1/20 0.35
▸ KMT2A Q03164 4/20 0.33
▸ MEN1 O00255 3/20 0.33
▸ MAPK8 P45983 2/20 0.33
▸ LMNA P02545 1/20 0.33
▸ IL1R1 P14778 1/20 0.33
▸ ALDH1A1 P00352 2/20 0.33
▸ SIGMAR1 Q99720 1/20 0.33
▸ MAPK9 P45984 1/20 0.33
▸ MAPT P10636 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ PGR P06401 1/20 0.33
▸ MAPK1 P28482 1/20 0.33
▸ JAK2 O60674 1/20 0.32
▸ JAK3 P52333 1/20 0.32
▸ POLB P06746 1/20 0.32
▸ TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921067 0.78 MAPT (0.55) KDM4EKMT2AMEN1LMNAALDH1A1
SCHEMBL11921068 0.78 KDM4E (0.33) L3MBTL1KDM4EKMT2AMEN1ALDH1A1
SCHEMBL30288 0.75 L3MBTL1 (0.75) L3MBTL1KDM4EATMKDRKMT2A
SCHEMBL21671314 0.75 L3MBTL1 (0.75) L3MBTL1KDM4EATMKDRKMT2A
SCHEMBL16573903 0.75 L3MBTL1 (0.75) L3MBTL1KDM4EATMKDRKMT2A
SCHEMBL25010820 0.75 L3MBTL1 (0.75) L3MBTL1KDM4EATMKDRKMT2A
SCHEMBL16605620 0.75 L3MBTL1 (0.75) L3MBTL1KDM4EATMKDRKMT2A
SCHEMBL3334280 0.75 L3MBTL1 (0.75) L3MBTL1KDM4EATMKDRKMT2A
SCHEMBL24531917 0.75 L3MBTL1 (0.75) L3MBTL1KDM4EATMKDRKMT2A
SCHEMBL30777262 0.75 L3MBTL1 (0.75) L3MBTL1KDM4EATMKDRKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9316911-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2016-04-19 — — US disclosed
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20130004741-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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