Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11921094 | 0.82 | NPC1 (0.41) | KDM4EMEN1ALDH1A1MAPTHPGD | |
| SCHEMBL11921095 | 0.78 | L3MBTL1 (0.55) | KDM4EMEN1ALDH1A1MAPTHTT | |
| SCHEMBL11921111 | 0.78 | KMT2A (0.40) | KDM4EMEN1ALDH1A1MAPTKMT2A | |
| SCHEMBL11921067 | 0.77 | MAPT (0.55) | KDM4EMEN1ALDH1A1MAPTHPGD | |
| SCHEMBL29352713 | 0.75 | GPR3 (0.46) | KDM4EMEN1ALDH1A1MAPTHPGD | |
| SCHEMBL17224383 | 0.75 | GPR3 (0.46) | KDM4EMEN1ALDH1A1MAPTHPGD | |
| SCHEMBL36244 | 0.75 | GPR3 (0.46) | KDM4EMEN1ALDH1A1MAPTHPGD | |
| SCHEMBL11921069 | 0.74 | POLB (0.58) | KDM4EMEN1ALDH1A1MAPTHPGD | |
| SCHEMBL11921098 | 0.74 | MCHR2 (0.45) | KDM4EMEN1ALDH1A1MAPTHPGD | |
| SCHEMBL22906590 | 0.74 | KDM4E (0.40) | KDM4EMEN1ALDH1A1MAPTHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-9316911-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2016-04-19 | — | — | US | disclosed |
| US-8940476-B2 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | FUJIFILM CORPORATION (JP) | 2015-01-27 | — | — | US | disclosed |
| US-8846293-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8841060-B2 | Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2014-09-23 | — | — | US | disclosed |
| US-20140234759-A1 | ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-21 | — | — | US | disclosed |
| US-20130004741-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20130004740-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20120264054-A1 | PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-10-18 | — | — | US | disclosed |
| US-20120251948-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120207978-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-16 | — | — | US | disclosed |