SCHEMBL11921115

SCHEMBL11921115

CCOC(=O)Cn1c2ccccc2c2cc([S+]3CCCC3)ccc21

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 6/20 0.54
▸ RAB9A P51151 1/20 0.54
▸ TDP1 Q9NUW8 1/20 0.50
▸ ALDH1A1 P00352 6/20 0.49
▸ L3MBTL1 Q9Y468 2/20 0.49
▸ LMNA P02545 1/20 0.49
▸ CNR2 P34972 2/20 0.48
▸ HSD17B10 Q99714 2/20 0.48
▸ HPGD P15428 1/20 0.48
▸ TSHR P16473 1/20 0.48
▸ SAE1 Q9UBE0 1/20 0.48
▸ UBA2 Q9UBT2 1/20 0.48
▸ MEN1 O00255 2/20 0.47
▸ KMT2A Q03164 2/20 0.47
▸ HTT P42858 1/20 0.47
▸ CTNNB1 P35222 1/20 0.45
▸ MAPT P10636 2/20 0.44
▸ MAPK1 P28482 1/20 0.44
▸ NPSR1 Q6W5P4 1/20 0.44
▸ TSPO P30536 3/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921102 0.87 KDM4E (0.53) KDM4ERAB9ATDP1ALDH1A1L3MBTL1
SCHEMBL29540705 0.81 KDM4E (0.71) KDM4ERAB9ATDP1ALDH1A1L3MBTL1
SCHEMBL151122 0.81 KDM4E (0.71) KDM4ERAB9ATDP1ALDH1A1L3MBTL1
SCHEMBL11921067 0.80 MAPT (0.55) KDM4ETDP1ALDH1A1LMNAHSD17B10
SCHEMBL29002814 0.77 KDM4E (0.63) KDM4ERAB9ATDP1ALDH1A1L3MBTL1
SCHEMBL11921069 0.75 POLB (0.58) KDM4ERAB9AALDH1A1L3MBTL1LMNA
SCHEMBL11921098 0.75 MCHR2 (0.45) KDM4ERAB9AALDH1A1L3MBTL1LMNA
SCHEMBL31372463 0.75 KDM4E (0.70) KDM4ERAB9ATDP1ALDH1A1L3MBTL1
SCHEMBL13066068 0.75 KDM4E (0.70) KDM4ERAB9ATDP1ALDH1A1L3MBTL1
SCHEMBL9144526 0.74 KDM4E (0.56) KDM4ERAB9ATDP1ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
Send feedback