SCHEMBL11921098

SCHEMBL11921098

COC(=O)n1c2ccccc2c2cc([S+]3CCCC3)ccc21

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MCHR2 Q969V1 1/20 0.45
▸ LMNA P02545 4/20 0.44
▸ POLB P06746 2/20 0.40
▸ MAPT P10636 4/20 0.38
▸ HTT P42858 1/20 0.38
▸ MEN1 O00255 2/20 0.37
▸ KMT2A Q03164 2/20 0.37
▸ NPSR1 Q6W5P4 1/20 0.37
▸ GABRP O00591 1/20 0.37
▸ GABRD O14764 1/20 0.37
▸ GABRA1 P14867 1/20 0.37
▸ GABRB1 P18505 1/20 0.37
▸ GABRG2 P18507 1/20 0.37
▸ GABRB3 P28472 1/20 0.37
▸ GABRA5 P31644 1/20 0.37
▸ GABRA3 P34903 1/20 0.37
▸ GABRA2 P47869 1/20 0.37
▸ GABRB2 P47870 1/20 0.37
▸ GABRA4 P48169 1/20 0.37
▸ GABRE P78334 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921069 0.85 POLB (0.58) MCHR2LMNAPOLBMAPTHTT
SCHEMBL11921099 0.82 POLB (0.40) MCHR2LMNAPOLBMAPTHTT
SCHEMBL11921096 0.81 P2RX4 (0.52) LMNAPOLBMAPTHTTMEN1
SCHEMBL20866891 0.78 POLB (0.61) MCHR2LMNAPOLBMAPTHTT
SCHEMBL11921095 0.75 L3MBTL1 (0.55) LMNAPOLBMAPTHTTMEN1
SCHEMBL11921115 0.75 KDM4E (0.54) LMNAMAPTHTTMEN1KMT2A
SCHEMBL11921067 0.74 MAPT (0.55) LMNAPOLBMAPTHTTMEN1
SCHEMBL11921068 0.74 KDM4E (0.33) MAPTHTTMEN1KMT2AKDM4E
SCHEMBL11921107 0.70 POLB (0.45) POLBMAPTHTTMEN1KMT2A
SCHEMBL11921090 0.68 ALDH1A1 (0.41) LMNAPOLBMAPTHTTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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