SCHEMBL11921069

SCHEMBL11921069

CC(=O)n1c2ccccc2c2cc([S+]3CCCC3)ccc21

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 2/20 0.58
▸ LMNA P02545 4/20 0.53
▸ TP53 P04637 1/20 0.43
▸ CREBBP Q92793 1/20 0.43
▸ MCHR2 Q969V1 1/20 0.43
▸ ALDH1A1 P00352 4/20 0.42
▸ KDM4E B2RXH2 3/20 0.42
▸ HPGD P15428 2/20 0.42
▸ GLA P06280 1/20 0.42
▸ GAA P10253 1/20 0.42
▸ HSD17B10 Q99714 1/20 0.42
▸ NPY5R Q15761 1/20 0.41
▸ MAPT P10636 3/20 0.40
▸ HTT P42858 1/20 0.40
▸ RAB9A P51151 2/20 0.40
▸ NPC1 O15118 1/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ TUBB4A P04350 2/20 0.39
▸ TUBB P07437 2/20 0.39
▸ TUBA3C P0DPH7 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11921099 0.85 POLB (0.40) POLBLMNAMCHR2ALDH1A1KDM4E
SCHEMBL11921098 0.85 MCHR2 (0.45) POLBLMNAMCHR2ALDH1A1KDM4E
SCHEMBL11921096 0.84 P2RX4 (0.52) POLBLMNAALDH1A1KDM4EHPGD
SCHEMBL11921095 0.78 L3MBTL1 (0.55) POLBLMNAALDH1A1KDM4EHSD17B10
SCHEMBL11921067 0.77 MAPT (0.55) POLBLMNATP53ALDH1A1KDM4E
SCHEMBL29787117 0.76 POLB (1.00) POLBLMNATP53CREBBPALDH1A1
SCHEMBL29771433 0.76 POLB (1.00) POLBLMNATP53CREBBPALDH1A1
SCHEMBL153365 0.76 POLB (1.00) POLBLMNATP53CREBBPALDH1A1
SCHEMBL11921115 0.75 KDM4E (0.54) LMNAALDH1A1KDM4EHPGDHSD17B10
SCHEMBL11921068 0.74 KDM4E (0.33) ALDH1A1KDM4EHPGDHSD17B10MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9316911-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2016-04-19 — — US disclosed
US-8846293-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition FUJIFILM CORPORATION (JP) 2014-09-30 — — US disclosed
US-20130004741-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
US-20120251948-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-04 — — US disclosed
US-20120207978-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 — — US disclosed
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