SCHEMBL11922895

SCHEMBL11922895

CCC(C)c1ccc(OCC(=O)N(c2ccccc2)c2ccc(S(=O)(=O)O)cc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.53
▸ TSHR P16473 1/20 0.53
▸ POLB P06746 1/20 0.45
▸ HSP90AA1 P07900 1/20 0.44
▸ HSP90AB1 P08238 1/20 0.44
▸ PDK1 Q15118 1/20 0.44
▸ PDK2 Q15119 1/20 0.44
▸ PDK3 Q15120 1/20 0.44
▸ PDK4 Q16654 1/20 0.44
▸ MEN1 O00255 2/20 0.41
▸ KMT2A Q03164 2/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41
▸ GAA P10253 1/20 0.41
▸ TP53 P04637 1/20 0.40
▸ SMN1; SMN2 Q16637 1/20 0.40
▸ NPC1 O15118 2/20 0.40
▸ RAB9A P51151 2/20 0.40
▸ SENP8 Q96LD8 1/20 0.40
▸ SENP7 Q9BQF6 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11922866 0.86 ALDH1A1 (0.53) ALDH1A1TSHRPOLBHSP90AA1HSP90AB1
SCHEMBL11922909 0.85 ALDH1A1 (0.53) ALDH1A1TSHRPOLBMEN1KMT2A
SCHEMBL12016660 0.81 ALDH1A1 (0.44) ALDH1A1TSHRPOLBMEN1KMT2A
SCHEMBL17175313 0.80 ALDH1A1 (0.49) ALDH1A1TSHRPOLBHSP90AA1HSP90AB1
SCHEMBL14461746 0.79 ALDH1A1 (0.42) ALDH1A1TSHRMEN1KMT2ANPC1
SCHEMBL14461742 0.79 ALDH1A1 (0.48) ALDH1A1TSHRPOLBMEN1KMT2A
SCHEMBL14119428 0.78 ALDH1A1 (0.58) ALDH1A1TSHRPOLBMEN1KMT2A
SCHEMBL11922883 0.78 ALDH1A1 (0.58) ALDH1A1TSHRPOLBMEN1KMT2A
SCHEMBL14464083 0.77 ALDH1A1 (0.55) ALDH1A1TSHRHSP90AA1MEN1KMT2A
SCHEMBL18119993 0.76 MEN1 (0.56) ALDH1A1TSHRMEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9235120-B2 Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask FUJIFILM CORPORATION (JP) 2016-01-12 — — US disclosed
US-20140178806-A1 NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, AND PHOTOMASK FUJIFILM CORPORATION (JP) 2014-06-26 — — US disclosed
US-20120202141-A1 CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST COATED MASK BLANKS AND RESIST PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-09 — — US disclosed
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