SCHEMBL11929792

SCHEMBL11929792

C=C(C)C(=O)OC1(C)CC(C)C(C)(C)C1(C)C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14539424 0.84 ALDH1A1 (0.32) ALDH1A1
SCHEMBL10231251 0.83 ALDH1A1 (0.31) ALDH1A1
SCHEMBL14416769 0.79 ALDH1A1 (0.36) ALDH1A1
SCHEMBL12894317 0.78 ALDH1A1 (0.35) ALDH1A1
SCHEMBL13359048 0.77 ALDH1A1 (0.31) ALDH1A1
SCHEMBL27568978 0.73 ALDH1A1 (0.31) ALDH1A1
SCHEMBL14394584 0.72 ALDH1A1 (0.31) ALDH1A1
SCHEMBL11230563 0.71 ALDH1A1 (0.35) ALDH1A1
SCHEMBL27856406 0.71 ALOX15 (0.37) ALDH1A1
SCHEMBL23494212 0.69 ALDH1A1 (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8241830-B2 Positive resist composition and a pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-08-14 US disclosed
US-7338740-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2008-03-04 US disclosed
US-7214465-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2007-05-08 US disclosed