SCHEMBL14394584

SCHEMBL14394584

C=C(C)C(=O)OC1(C)CC2C(C)CC1(C)C2(C)C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11929792 0.72 ALDH1A1 (0.33) ALDH1A1
SCHEMBL2740744 0.72 L3MBTL1 (0.34) ALDH1A1
SCHEMBL13713816 0.68 ALDH1A1 (0.35) ALDH1A1
SCHEMBL11230563 0.68 ALDH1A1 (0.35) ALDH1A1
SCHEMBL5918253 0.68 ALDH1A1 (0.35) ALDH1A1
SCHEMBL14539424 0.68 ALDH1A1 (0.32) ALDH1A1
SCHEMBL14389410 0.67 ALDH1A1 (0.34) ALDH1A1
SCHEMBL10231251 0.67 ALDH1A1 (0.31) ALDH1A1
SCHEMBL5918123 0.67 ALDH1A1 (0.31) ALDH1A1
SCHEMBL13359048 0.67 ALDH1A1 (0.31) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7285369-B2 photoresist composition comprising resins that increases solubility in alkali developing solution by the action of an acid and photoacid generators, which exhibits high sensitivity, high resolution and stability FUJIFILM CORPORATION (JP) 2007-10-23 US disclosed
US-20070141513-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-06-21 US disclosed