Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 9/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.46 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.46 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | PGR | P06401 | 1/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.42 |
| ▸ | AR | P10275 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | DRD1 | P21728 | 1/20 | 0.42 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.42 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18903327 | 0.85 | ESR1 (0.43) | ESR1ESR2PDCD1CD274CYP2C9 | |
| SCHEMBL13161404 | 0.83 | ESR1 (0.42) | ESR1ESR2PDCD1CD274CYP2C9 | |
| SCHEMBL7050045 | 0.80 | ESR1 (0.44) | ESR1ESR2PDCD1CD274CYP2C9 | |
| SCHEMBL12956676 | 0.80 | TDP1 (0.40) | TDP1CYP3A4MAPTALDH1A1HIF1A | |
| SCHEMBL14540127 | 0.79 | SLC6A3 (0.46) | LMNACHRM2CHRM1SLC6A2ADRA1A | |
| SCHEMBL12086475 | 0.79 | ESR1 (0.56) | ESR1ESR2PDCD1CD274CYP2C9 | |
| SCHEMBL22211043 | 0.79 | ALDH1A1 (0.41) | ESR1ESR2PDCD1CD274CYP2C9 | |
| SCHEMBL19259213 | 0.78 | ATM (0.42) | TDP1LMNAMAPTALDH1A1SMN1; SMN2 | |
| SCHEMBL14227866 | 0.78 | ALDH1A1 (0.46) | TDP1CYP1A2CYP2D6SLC6A2CYP2C19 | |
| SCHEMBL14469724 | 0.78 | ADRB1 (0.50) | ESR1ESR2LMNACYP3A4DRD1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9761449-B2 | Gap filling materials and methods | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-09-12 | — | — | US | disclosed |
| EP-2479611-A2 | Chemically amplified positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-07-25 | — | — | EP | disclosed |
| EP-2244124-A2 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-2244126-A2 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| EP-1914070-B1 | Image recording material and lithographic printing plate precursor | FUJIFILM CORP (JP) | 2009-10-21 | — | — | EP | disclosed |
| EP-1835341-B1 | Positive resist composition and pattern forming method using the same | FUJIFILM CORP (JP) | 2009-06-24 | — | — | EP | disclosed |
| EP-1906248-A1 | Resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |
| EP-1764652-A2 | Positive resist composition and pattern-forming method using the same | FUJIFILM Corporation (JP) | 2007-03-21 | — | — | EP | disclosed |