SCHEMBL11964019

SCHEMBL11964019

CCOC(=O)C1C(=O)ON=C1c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.44
RAB9A P51151 2/20 0.44
ALDH1A1 P00352 6/20 0.43
KDM4E B2RXH2 3/20 0.41
MAPK1 P28482 1/20 0.40
KMT2A Q03164 3/20 0.40
HPGD P15428 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
HSD17B10 Q99714 1/20 0.40
NPC1 O15118 1/20 0.40
LMNA P02545 1/20 0.40
GAA P10253 1/20 0.40
MAPT P10636 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
MEN1 O00255 2/20 0.39
ATM Q13315 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C19 P33261 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11964011 0.84 ALDH1A1 (0.39) TSHRALDH1A1KDM4EHPGDSMN1; SMN2
SCHEMBL22897261 0.79 ALDH1A1 (0.38) TSHRALDH1A1KDM4EKMT2AHPGD
SCHEMBL11964018 0.78 TSHR (0.43) TSHRRAB9AALDH1A1MAPK1KMT2A
SCHEMBL2653688 0.75 TSHR (0.53) TSHRRAB9AALDH1A1KDM4EHPGD
SCHEMBL29571711 0.75 ALDH1A1 (0.50) RAB9AALDH1A1KDM4EKMT2AHPGD
SCHEMBL10462661 0.74 RAB9A (0.43) TSHRRAB9AALDH1A1KDM4EMAPK1
SCHEMBL10463748 0.73 RAB9A (0.43) TSHRRAB9AALDH1A1KDM4EMAPK1
SCHEMBL20540334 0.72 TSHR (0.48) TSHRRAB9AALDH1A1KDM4EKMT2A
SCHEMBL20511467 0.72 TSHR (0.48) TSHRRAB9AALDH1A1KDM4EKMT2A
SCHEMBL19974968 0.72 TSHR (0.51) TSHRRAB9AALDH1A1KDM4EMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed