SCHEMBL11964237

SCHEMBL11964237

O=C(O)C1CCCCCCCCCCCCCC1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CES2 O00748 1/20 0.61
▸ CES1 P23141 1/20 0.61
▸ TSHR P16473 3/20 0.52
▸ GABRP O00591 1/20 0.52
▸ GABRD O14764 1/20 0.52
▸ GABRA1 P14867 1/20 0.52
▸ GABRB1 P18505 1/20 0.52
▸ GABRG2 P18507 1/20 0.52
▸ GABRB3 P28472 1/20 0.52
▸ GABRA5 P31644 1/20 0.52
▸ GABRA3 P34903 1/20 0.52
▸ GABRA2 P47869 1/20 0.52
▸ GABRB2 P47870 1/20 0.52
▸ GABRA4 P48169 1/20 0.52
▸ GABRE P78334 1/20 0.52
▸ PMP22 Q01453 1/20 0.52
▸ GABRA6 Q16445 1/20 0.52
▸ GABRG1 Q8N1C3 1/20 0.52
▸ GABRG3 Q99928 1/20 0.52
▸ GABRQ Q9UN88 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5493736 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD
SCHEMBL242069 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD
SCHEMBL1260777 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD
SCHEMBL1072831 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD
SCHEMBL1873055 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD
SCHEMBL25212375 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD
SCHEMBL10188550 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD
SCHEMBL11964239 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD
SCHEMBL304519 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD
SCHEMBL12491655 1.00 CES2 (0.61) CES2CES1TSHRGABRPGABRD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119768497-A Treatment composition with perfume-containing delivery particles 恩盖普有限公司 2025-04-04 — — CN claimed
CN-116685316-A Compositions and methods for treating lipid-related disorders 拉结尔治疗有限公司 2023-09-01 — — CN claimed
EP-4620945-A1 CATIONIC LIPIDS AND METHOD FOR PREPARING SAME Samyang Holdings Corporation (KR) 2025-09-24 — — EP disclosed
CN-120129674-A Cationic lipids and methods of making the same 三养控股公司 2025-06-10 — — CN disclosed
CN-120053661-A Hydrophilic fatty acid complex for preventing, preventing or treating microbial infection, preparation and application thereof 太阳雨林(北京)生物医药有限公司 2025-05-30 — — CN disclosed
CN-120053660-A Hydrophilic complex for preventing, preventing or treating microbial infection, preparation and application thereof 太阳雨林(北京)生物医药有限公司 2025-05-30 — — CN disclosed
CN-119855607-A Carbon chain substance for regulating transmembrane transport and fluidity of cell membrane, preparation and application 太阳雨林(北京)生物医药有限公司 2025-04-18 — — CN disclosed
CN-119790197-A Hydrophilizing agent, nonwoven fabric, and method for producing nonwoven fabric 竹本油脂株式会社 2025-04-08 — — CN disclosed
CN-119677582-A Method for producing coated organic particles 巴斯夫欧洲公司 2025-03-21 — — CN disclosed
CN-119661621-A Steroid compound, preparation method thereof, pharmaceutical composition and application 北京华睿鼎信科技有限公司 2025-03-21 — — CN disclosed
CN-119677631-A Laser-weldable polyester compositions, method for the production thereof and use thereof 恩骅力有限公司 2025-03-21 — — CN disclosed
US-20170130070-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 — — US disclosed
US-20170130071-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 — — US disclosed
US-9360753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-07 — — US disclosed
US-9164383-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-20 — — US disclosed
US-8545984-B2 Photochromic compounds and compositions TRANSITIONS OPTICAL, INC. (US) 2013-10-01 — — US disclosed
US-20130029270-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-31 — — US disclosed
US-20120202153-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 — — US disclosed
US-20120202153-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 — — US disclosed
US-20090286995-A1 METHOD FOR THE PRODUCTION OF BORONIC ACIDS CARRYING CYANOALKYL, CARBOXYL AND AMINOCARBONYL GROUPS AND THEIR DERIVATIVES ARCHIMICA GMBH (DE) 2009-11-19 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090286995-A1 METHOD FOR THE PRODUCTION OF BORONIC ACIDS CARRYING CYANOALKYL, CARBOXYL AND AMINOCARBONYL GROUPS AND THEIR DERIVATIVES BCAT1, BCAT2, SLC1A5 CES2 532/4885CES1 1095/4885TSHR 2512/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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