SCHEMBL119729

SCHEMBL119729

Oc1ccc2c3c(cccc13)C=C2

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RECQL P46063 3/20 0.58
HPGD P15428 3/20 0.58
HSD17B10 Q99714 3/20 0.58
MAPT P10636 2/20 0.58
ALOX15 P16050 2/20 0.58
TDP1 Q9NUW8 2/20 0.58
APP P05067 1/20 0.58
THRB P10828 1/20 0.58
TSHR P16473 1/20 0.58
CASP1 P29466 1/20 0.58
SNCA P37840 1/20 0.58
IDO1 P14902 3/20 0.48
CYP1A2 P05177 2/20 0.41
EP300 Q09472 2/20 0.38
KAT2B Q92831 2/20 0.38
KAT8 Q9H7Z6 2/20 0.38
HDAC3 O15379 1/20 0.38
NCOR2 Q9Y618 1/20 0.38
LMNA P02545 3/20 0.34
MEN1 O00255 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL924802 0.92 HSD17B10 (0.50) RECQLHPGDHSD17B10MAPTALOX15
SCHEMBL3754754 0.88 MAPT (0.47) RECQLHPGDHSD17B10MAPTALOX15
SCHEMBL3757442 0.82 MAPT (0.41) RECQLHPGDHSD17B10MAPTALOX15
SCHEMBL4201879 0.79 CYP1A2 (0.42) RECQLHPGDHSD17B10MAPTALOX15
6-Hydroxy-1H-Phenalen-1-One SCHEMBL6229904 0.78 MEN1 (0.47) RECQLHPGDHSD17B10MAPTALOX15
SCHEMBL12486669 0.76 HPGD (0.37) RECQLHPGDHSD17B10MAPTALOX15
SCHEMBL6155518 0.75 IDO1 (0.44) IDO1EP300KAT2BKAT8
SCHEMBL9717920 0.74 APP (0.45) RECQLHPGDHSD17B10MAPTALOX15
SCHEMBL16964855 0.74 MAPT (0.45) RECQLHPGDHSD17B10MAPTALOX15
SCHEMBL10884065 0.74 RECQL (0.70) RECQLHPGDHSD17B10MAPTALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 311 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250163200-A1 DIPHENYL(METH)ACRYLAMIDE-CONTAINING THERMOSETTING RESIN COMPOSITION AND CURED PRODUCT THEREFROM NIPPON SODA CO., LTD. (JP) 2025-05-22 US disclosed
EP-4501994-A1 DIPHENYL(METH)ACRYLAMIDE-CONTAINING THERMOSETTING RESIN COMPOSITION AND CURED PRODUCT THEREFROM Nippon Soda Co., Ltd. (JP) 2025-02-05 EP disclosed
US-20240409674-A1 NOVEL POLYMER, RESIN COMPOSITION INCLUDING SAME, AND MOLDED BODY THEREOF NIPPON SODA CO., LTD. (JP) 2024-12-12 US disclosed
CN-118871485-A Thermosetting resin composition containing diphenyl (methyl) acrylamide and its cured product 日本曹达株式会社 2024-10-29 CN disclosed
US-20240309138-A1 NOVEL (METH)ACRYLAMIDE POLYMER, RESIN COMPOSITION CONTAINING SAME, AND MOLDED BODY THEREOF NIPPON SODA CO., LTD. (JP) 2024-09-19 US disclosed
US-12024590-B2 Resin composition, prepreg, film with resin, metal foil with resin, metal-clad laminate, and wiring board PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2024-07-02 US disclosed
EP-4372019-A1 NOVEL (METH)ACRYLAMIDE POLYMER, RESIN COMPOSITION CONTAINING SAME, AND MOLDED BODY THEREOF Nippon Soda Co., Ltd. (JP) 2024-05-22 EP disclosed
EP-4372015-A1 NOVEL POLYMER, RESIN COMPOSITION INCLUDING SAME, AND MOLDED BODY THEREOF Nippon Soda Co., Ltd. (JP) 2024-05-22 EP disclosed
CN-115304574-B Heterocyclic compound and application thereof in organic electroluminescent device 上海钥熠电子科技有限公司 2024-04-26 CN disclosed
WO-2024070535-A1 RESIST PATTERN FORMATION METHOD JSR株式会社 2024-04-04 WO disclosed
WO-2008075860-A1 HIGH ETCH RESISTANT HARDMASK COMPOSITION HAVING ANTIREFLECTIVE PROPERTIES, METHOD FOR FORMING PATTERNED MATERIAL LAYER USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE PRODUCED USING THE METHOD CHEIL INDUSTRIES INC. (KR) 2008-06-26 WO disclosed
US-20070248911-A1 Pattern forming method and bilayer film IWASAWA HARUO 2007-10-25 US disclosed
US-7244549-B2 Pattern forming method and bilayer film JSR CORPORATION (JP) 2007-07-17 US disclosed
CN-1282901-C Radioactive ray sensitive composition, black array, color filter and color liquid crystal display device JSR CO LTD (JP) 2006-11-01 CN disclosed
US-6852791-B2 Anti-reflection coating forming composition JSR CORPORATION (JP) 2005-02-08 US disclosed
EP-1205805-B1 Anti-reflection coating forming composition JSR CORP (JP) 2004-09-15 EP disclosed
CN-1512269-A Radioactive ray sensitive composition, black array, color filter and color liquid crystal display device JSR株式会社 2004-07-14 CN disclosed
US-20030073040-A1 Pattern forming method and bilayer film JSR CORPORATION (JP) 2003-04-17 US disclosed
US-20020086934-A1 Anti-reflection coating forming composition JSR CORPORATION (JP) 2002-07-04 US disclosed
EP-1205805-A1 Anti-reflection coating forming composition JSR Corporation (JP) 2002-05-15 EP disclosed