SCHEMBL3757442

SCHEMBL3757442

C1=Cc2cccc3cccc1c23.Clc1ccc2c3c(cccc13)C=C2.Oc1ccc2c3c(cccc13)C=C2

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.41
TSHR P16473 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
APP P05067 1/20 0.41
THRB P10828 1/20 0.41
HPGD P15428 1/20 0.41
ALOX15 P16050 1/20 0.41
CASP1 P29466 1/20 0.41
SNCA P37840 1/20 0.41
RECQL P46063 1/20 0.41
HSD17B10 Q99714 1/20 0.41
HSD17B1 P14061 1/20 0.37
HSD17B2 P37059 1/20 0.37
CYP1A2 P05177 5/20 0.37
CYP2A6 P11509 3/20 0.37
KDM4E B2RXH2 1/20 0.37
BRD4 O60885 1/20 0.37
LMNA P02545 1/20 0.37
HSP90AA1 P07900 1/20 0.37
METAP2 P50579 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3754754 0.93 MAPT (0.47) MAPTTSHRTDP1APPTHRB
SCHEMBL924802 0.90 HSD17B10 (0.50) MAPTTSHRTDP1APPTHRB
SCHEMBL3754651 0.86 MEN1 (0.38) MAPTTSHRTDP1APPTHRB
SCHEMBL3408215 0.82 CYP1A2 (0.48) MAPTTSHRTDP1HPGDCYP1A2
SCHEMBL119729 0.82 RECQL (0.58) MAPTTSHRTDP1APPTHRB
SCHEMBL3754760 0.79 MEN1 (0.36) MAPTTSHRTDP1APPTHRB
4-Vinylphenol SCHEMBL3761803 0.79 MAPT (0.34) MAPTTSHRTDP1APPTHRB
4-Vinylphenol SCHEMBL3759703 0.79 MEN1 (0.35) CYP1A2CYP2A6MEN1KMT2AABCG2
Indene SCHEMBL3764886 0.79 MAPT (0.34) MAPTTSHRTDP1APPTHRB
SCHEMBL21972146 0.73 CYP3A4 (0.41) MAPTTSHRTDP1APPTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8361692-B2 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-29 US disclosed
US-20100304301-A1 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed