SCHEMBL3754754

SCHEMBL3754754

Clc1ccc2c3c(cccc13)C=C2.Oc1ccc2c3c(cccc13)C=C2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.47
TSHR P16473 3/20 0.47
TDP1 Q9NUW8 2/20 0.47
HPGD P15428 2/20 0.47
RECQL P46063 2/20 0.47
APP P05067 1/20 0.47
THRB P10828 1/20 0.47
ALOX15 P16050 1/20 0.47
CASP1 P29466 1/20 0.47
SNCA P37840 1/20 0.47
HSD17B10 Q99714 1/20 0.47
KDM4E B2RXH2 2/20 0.41
LMNA P02545 2/20 0.41
BRD4 O60885 1/20 0.41
HSP90AA1 P07900 1/20 0.41
METAP2 P50579 1/20 0.41
METAP1 P53582 1/20 0.41
CYP1A2 P05177 5/20 0.38
CYP2A6 P11509 3/20 0.38
IDO1 P14902 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3757442 0.93 MAPT (0.41) MAPTTSHRTDP1HPGDRECQL
SCHEMBL119729 0.88 RECQL (0.58) MAPTTSHRTDP1HPGDRECQL
SCHEMBL3408215 0.88 CYP1A2 (0.48) MAPTTSHRTDP1HPGDKDM4E
Indene SCHEMBL3764886 0.84 MAPT (0.34) MAPTTSHRTDP1HPGDRECQL
SCHEMBL3754760 0.84 MEN1 (0.36) MAPTTSHRTDP1HPGDRECQL
4-Vinylphenol SCHEMBL3761803 0.84 MAPT (0.34) MAPTTSHRTDP1HPGDRECQL
SCHEMBL924802 0.81 HSD17B10 (0.50) MAPTTSHRTDP1HPGDRECQL
SCHEMBL3754651 0.80 MEN1 (0.38) MAPTTSHRTDP1HPGDRECQL
4-Vinylphenol SCHEMBL3759703 0.72 MEN1 (0.35) CYP1A2CYP2A6MEN1KMT2A
SCHEMBL8016962 0.71 TSHR (0.52) MAPTTSHRTDP1HPGDRECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8361692-B2 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-29 US disclosed
US-20100304301-A1 Negative resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed