SCHEMBL924802

SCHEMBL924802

C1=Cc2cccc3cccc1c23.Oc1ccc2c3c(cccc13)C=C2

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.50
THRB P10828 3/20 0.50
HPGD P15428 2/20 0.50
MAPT P10636 2/20 0.50
APP P05067 1/20 0.50
ALOX15 P16050 1/20 0.50
TSHR P16473 1/20 0.50
CASP1 P29466 1/20 0.50
SNCA P37840 1/20 0.50
RECQL P46063 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
CYP1A2 P05177 3/20 0.45
IDO1 P14902 2/20 0.41
PTPN22 Q9Y2R2 1/20 0.38
ALDH1A1 P00352 2/20 0.37
CDK2 P24941 1/20 0.36
POLB P06746 2/20 0.36
KDM4E B2RXH2 2/20 0.36
MEN1 O00255 1/20 0.36
GAA P10253 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL119729 0.92 RECQL (0.58) HSD17B10THRBHPGDMAPTAPP
SCHEMBL3757442 0.90 MAPT (0.41) HSD17B10THRBHPGDMAPTAPP
SCHEMBL3754754 0.81 MAPT (0.47) HSD17B10THRBHPGDMAPTAPP
SCHEMBL4201879 0.79 CYP1A2 (0.42) HSD17B10THRBHPGDMAPTAPP
SCHEMBL29575794 0.78 ALDH1A1 (0.53) HSD17B10THRBHPGDMAPTAPP
SCHEMBL8872842 0.78 ALDH1A1 (0.53) HSD17B10THRBHPGDMAPTAPP
SCHEMBL26037 0.78 ALDH1A1 (0.53) HSD17B10THRBHPGDMAPTAPP
SCHEMBL3754651 0.77 MEN1 (0.38) HSD17B10THRBHPGDMAPTAPP
SCHEMBL9880000 0.77 TSHR (0.39) HSD17B10THRBHPGDMAPTAPP
Methyl Alcohol SCHEMBL1324423 0.75 ALDH1A1 (0.45) HSD17B10THRBHPGDMAPTAPP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8389201-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-05 US disclosed
US-20110003251-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-01-06 US disclosed