SCHEMBL119916

SCHEMBL119916

Oc1ccc2cccc3c2c1C=C3

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDK2 P24941 1/20 0.41
ALDH1A1 P00352 4/20 0.40
CYP1A2 P05177 4/20 0.40
HSD17B10 Q99714 4/20 0.40
HPGD P15428 3/20 0.40
TSHR P16473 3/20 0.40
CYP3A4 P08684 2/20 0.40
CYP1A1 P04798 1/20 0.40
CYP1B1 Q16678 1/20 0.40
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
PTPN22 Q9Y2R2 1/20 0.34
DNMT1 P26358 1/20 0.34
CACNA1B Q00975 1/20 0.34
APBA1 Q02410 1/20 0.34
MCL1 Q07820 1/20 0.34
APOBEC3G Q9HC16 1/20 0.34
POLB P06746 2/20 0.33
MAPT P10636 2/20 0.33
THRB P10828 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30836083 0.88 CDK2 (0.39) CDK2ALDH1A1CYP1A2HSD17B10HPGD
SCHEMBL9123630 0.77
SCHEMBL18354862 0.76 ALDH1A1 (0.37) ALDH1A1CYP1A2HSD17B10HPGDTSHR
SCHEMBL13306158 0.76 ALDH1A1 (0.46) CDK2ALDH1A1CYP1A2HSD17B10HPGD
SCHEMBL8712767 0.75 ALDH1A1 (0.40) ALDH1A1CYP1A2HSD17B10HPGDTSHR
SCHEMBL5379749 0.75 ALDH1A1 (0.40) ALDH1A1CYP1A2HSD17B10HPGDTSHR
SCHEMBL34461112 0.75 ALDH1A1 (0.40) ALDH1A1CYP1A2HSD17B10HPGDTSHR
SCHEMBL5033504 0.75 ALDH1A1 (0.40) ALDH1A1CYP1A2HSD17B10HPGDTSHR
SCHEMBL5376472 0.75 ALDH1A1 (0.40) ALDH1A1CYP1A2HSD17B10HPGDTSHR
SCHEMBL5039138 0.75 ALDH1A1 (0.40) ALDH1A1CYP1A2HSD17B10HPGDTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 247 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250163200-A1 DIPHENYL(METH)ACRYLAMIDE-CONTAINING THERMOSETTING RESIN COMPOSITION AND CURED PRODUCT THEREFROM NIPPON SODA CO., LTD. (JP) 2025-05-22 US disclosed
EP-4501994-A1 DIPHENYL(METH)ACRYLAMIDE-CONTAINING THERMOSETTING RESIN COMPOSITION AND CURED PRODUCT THEREFROM Nippon Soda Co., Ltd. (JP) 2025-02-05 EP disclosed
US-20240409674-A1 NOVEL POLYMER, RESIN COMPOSITION INCLUDING SAME, AND MOLDED BODY THEREOF NIPPON SODA CO., LTD. (JP) 2024-12-12 US disclosed
CN-118871485-A Thermosetting resin composition containing diphenyl (methyl) acrylamide and its cured product 日本曹达株式会社 2024-10-29 CN disclosed
US-20240309138-A1 NOVEL (METH)ACRYLAMIDE POLYMER, RESIN COMPOSITION CONTAINING SAME, AND MOLDED BODY THEREOF NIPPON SODA CO., LTD. (JP) 2024-09-19 US disclosed
US-12024590-B2 Resin composition, prepreg, film with resin, metal foil with resin, metal-clad laminate, and wiring board PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2024-07-02 US disclosed
EP-4372019-A1 NOVEL (METH)ACRYLAMIDE POLYMER, RESIN COMPOSITION CONTAINING SAME, AND MOLDED BODY THEREOF Nippon Soda Co., Ltd. (JP) 2024-05-22 EP disclosed
EP-4372015-A1 NOVEL POLYMER, RESIN COMPOSITION INCLUDING SAME, AND MOLDED BODY THEREOF Nippon Soda Co., Ltd. (JP) 2024-05-22 EP disclosed
CN-117597372-A Novel (meth) acrylamide polymer, resin composition containing the same, and molded article thereof 日本曹达株式会社 2024-02-23 CN disclosed
CN-117597371-A Novel polymer, resin composition containing the same, and molded article thereof 日本曹达株式会社 2024-02-23 CN disclosed
US-20100159404-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 US disclosed
US-20100055621-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-04 US disclosed
US-20100055621-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-04 US disclosed
US-20070248911-A1 Pattern forming method and bilayer film IWASAWA HARUO 2007-10-25 US disclosed
US-7244549-B2 Pattern forming method and bilayer film JSR CORPORATION (JP) 2007-07-17 US disclosed
US-6852791-B2 Anti-reflection coating forming composition JSR CORPORATION (JP) 2005-02-08 US disclosed
EP-1205805-B1 Anti-reflection coating forming composition JSR CORP (JP) 2004-09-15 EP disclosed
US-20030073040-A1 Pattern forming method and bilayer film JSR CORPORATION (JP) 2003-04-17 US disclosed
US-20020086934-A1 Anti-reflection coating forming composition JSR CORPORATION (JP) 2002-07-04 US disclosed
EP-1205805-A1 Anti-reflection coating forming composition JSR Corporation (JP) 2002-05-15 EP disclosed