SCHEMBL5376472

SCHEMBL5376472

Sc1ccc2cccc3c2c1C=C3

nearest known ligand 0.40

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.40
HSD17B10 Q99714 3/20 0.40
TSHR P16473 3/20 0.40
CYP1A2 P05177 2/20 0.40
HPGD P15428 2/20 0.40
CYP3A4 P08684 2/20 0.40
CYP1A1 P04798 1/20 0.40
CYP1B1 Q16678 1/20 0.40
THRB P10828 1/20 0.33
MAPK1 P28482 1/20 0.30
ATM Q13315 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL34461112 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRCYP1A2HPGD
SCHEMBL5033180 0.75 ALDH1A1 (0.47) ALDH1A1HSD17B10TSHRCYP1A2HPGD
SCHEMBL119916 0.75 CDK2 (0.41) ALDH1A1HSD17B10TSHRCYP1A2HPGD
SCHEMBL5039138 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRCYP1A2HPGD
SCHEMBL8712767 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRCYP1A2HPGD
SCHEMBL5379749 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRCYP1A2HPGD
SCHEMBL5033504 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRCYP1A2HPGD
SCHEMBL29575794 0.74 ALDH1A1 (0.53) ALDH1A1HSD17B10TSHRCYP1A2HPGD
SCHEMBL26037 0.74 ALDH1A1 (0.53) ALDH1A1HSD17B10TSHRCYP1A2HPGD
SCHEMBL8872842 0.74 ALDH1A1 (0.53) ALDH1A1HSD17B10TSHRCYP1A2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070248911-A1 Pattern forming method and bilayer film IWASAWA HARUO 2007-10-25 US disclosed
US-7244549-B2 Pattern forming method and bilayer film JSR CORPORATION (JP) 2007-07-17 US disclosed
US-6852791-B2 Anti-reflection coating forming composition JSR CORPORATION (JP) 2005-02-08 US disclosed
EP-1205805-B1 Anti-reflection coating forming composition JSR CORP (JP) 2004-09-15 EP disclosed
US-20030073040-A1 Pattern forming method and bilayer film JSR CORPORATION (JP) 2003-04-17 US disclosed
US-20020086934-A1 Anti-reflection coating forming composition JSR CORPORATION (JP) 2002-07-04 US disclosed
EP-1205805-A1 Anti-reflection coating forming composition JSR Corporation (JP) 2002-05-15 EP disclosed