SCHEMBL5379749

SCHEMBL5379749

Nc1ccc2cccc3c2c1C=C3

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.40
HSD17B10 Q99714 4/20 0.40
TSHR P16473 4/20 0.40
HPGD P15428 3/20 0.40
CYP3A4 P08684 3/20 0.40
CYP1A2 P05177 2/20 0.40
CYP1A1 P04798 1/20 0.40
CYP1B1 Q16678 1/20 0.40
THRB P10828 1/20 0.33
JAK2 O60674 1/20 0.32
RPS6KA3 P51812 1/20 0.32
MELK Q14680 1/20 0.32
STK24 Q9Y6E0 1/20 0.32
RAD52 P43351 1/20 0.32
KEAP1 Q14145 1/20 0.32
P2RX4 Q99571 1/20 0.32
TYMS P04818 1/20 0.31
BACE1 P56817 1/20 0.31
KDM4E B2RXH2 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28635342 0.79 ALDH1A1 (0.33) ALDH1A1HSD17B10TSHRHPGDCYP3A4
SCHEMBL27743710 0.77
SCHEMBL34461112 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRHPGDCYP3A4
SCHEMBL5039138 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRHPGDCYP3A4
SCHEMBL5033180 0.75 ALDH1A1 (0.47) ALDH1A1HSD17B10TSHRHPGDCYP3A4
SCHEMBL119916 0.75 CDK2 (0.41) ALDH1A1HSD17B10TSHRHPGDCYP3A4
SCHEMBL5033504 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRHPGDCYP3A4
SCHEMBL5376472 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRHPGDCYP3A4
SCHEMBL8712767 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10TSHRHPGDCYP3A4
SCHEMBL29575794 0.74 ALDH1A1 (0.53) ALDH1A1HSD17B10TSHRHPGDCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070248911-A1 Pattern forming method and bilayer film IWASAWA HARUO 2007-10-25 US disclosed
US-7244549-B2 Pattern forming method and bilayer film JSR CORPORATION (JP) 2007-07-17 US disclosed
US-6852791-B2 Anti-reflection coating forming composition JSR CORPORATION (JP) 2005-02-08 US disclosed
EP-1205805-B1 Anti-reflection coating forming composition JSR CORP (JP) 2004-09-15 EP disclosed
US-20030073040-A1 Pattern forming method and bilayer film JSR CORPORATION (JP) 2003-04-17 US disclosed
US-20020086934-A1 Anti-reflection coating forming composition JSR CORPORATION (JP) 2002-07-04 US disclosed
EP-1205805-A1 Anti-reflection coating forming composition JSR Corporation (JP) 2002-05-15 EP disclosed