Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.34 |
| ▸ | CASP1 | P29466 | 1/20 | 0.34 |
| ▸ | ABCB1 | P08183 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11998998 | 0.77 | ALDH1A1 (0.36) | ALDH1A1TSHRSLC7A5GAAMAPT | |
| SCHEMBL29723819 | 0.77 | SLC6A2 (0.38) | TSHRSIGMAR1 | |
| SCHEMBL14665274 | 0.76 | ALDH1A1 (0.44) | ALDH1A1TSHRSLC7A5GAAMAPT | |
| SCHEMBL15503538 | 0.76 | SLC7A5 (0.39) | ALDH1A1TSHRSLC7A5GAAMAPT | |
| SCHEMBL15503541 | 0.75 | SLC7A5 (0.39) | ALDH1A1TSHRSLC7A5GAAMAPT | |
| SCHEMBL11998994 | 0.74 | ALDH1A1 (0.42) | ALDH1A1TSHRSLC7A5GAAMAPT | |
| SCHEMBL5039115 | 0.73 | SIGMAR1 (0.35) | SMN1; SMN2MEN1KMT2ALMNASIGMAR1 | |
| SCHEMBL5036744 | 0.71 | RET (0.36) | SMN1; SMN2LMNASIGMAR1 | |
| SCHEMBL11998988 | 0.70 | FFAR1 (0.47) | ALDH1A1TSHRSLC7A5GAAMAPT | |
| SCHEMBL4516491 | 0.69 | RET (0.42) | SMN1; SMN2MEN1KMT2ALMNASIGMAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120214091-A1 | RESIST FILM, RESIST COATED MASK BLANKS AND METHOD OF FORMING RESIST PATTERN USING THE RESIST FILM, AND CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-23 | — | — | US | disclosed |