Dioxane

Dioxane

SCHEMBL12004584

C1COCCO1.O=Cc1ccc2cc(O)ccc2c1

nearest known ligand 0.47

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH5A1 P51649 1/20 0.47
ABAT P80404 1/20 0.47
KDM4E B2RXH2 1/20 0.42
PTGS2 P35354 1/20 0.42
RAB9A P51151 1/20 0.42
ALDH3A1 P30838 1/20 0.41
ALDH1A3 P47895 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2A6 P11509 4/20 0.41
HSD17B10 Q99714 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
ESR1 P03372 2/20 0.38
ESR2 Q92731 2/20 0.38
CYP3A4 P08684 1/20 0.38
ALOX15 P16050 1/20 0.38
TSHR P16473 1/20 0.38
HIF1A Q16665 1/20 0.38
ALDH1A1 P00352 3/20 0.38
RRM1 P23921 1/20 0.38
HCAR2 Q8TDS4 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12004582 0.92 ALDH5A1 (0.42) ALDH5A1ABATKDM4EPTGS2RAB9A
SCHEMBL658295 0.89 ALDH5A1 (0.58) ALDH5A1ABATKDM4EPTGS2RAB9A
SCHEMBL29794356 0.89 ALDH5A1 (0.58) ALDH5A1ABATKDM4EPTGS2RAB9A
SCHEMBL31473053 0.89 ALDH5A1 (0.58) ALDH5A1ABATKDM4EPTGS2RAB9A
SCHEMBL19066455 0.85 ALDH5A1 (0.54) ALDH5A1ABATKDM4EPTGS2RAB9A
SCHEMBL3074283 0.83 ALDH5A1 (0.56) ALDH5A1ABATKDM4EPTGS2RAB9A
2-Naphthaldehyde SCHEMBL12004069 0.81 RELA (0.47) KDM4ERAB9AALDH3A1ALDH1A3CYP2A6
SCHEMBL10331765 0.81 ESR1 (0.61) ALDH5A1ABATCYP1A2ESR1ESR2
Dimethyl Sulfoxide SCHEMBL28189523 0.79 ALDH5A1 (0.47) ALDH5A1ABATKDM4EPTGS2RAB9A
4-Hydroxybenzaldehyde SCHEMBL7168177 0.78 ALDH5A1 (0.76) ALDH5A1ABATKDM4EPTGS2RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8778592-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-15 US disclosed
US-20120220112-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-30 US disclosed