SCHEMBL12019103

SCHEMBL12019103

O=C(OCC12CC3CC(CC(C3)C1)C2)C1CCCCC1C(=O)OC(C(F)F)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.37
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32
SCN9A Q15858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12657987 0.84 ALDH1A1 (0.39) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL11991781 0.83 ALDH1A1 (0.37) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL13849598 0.83 ALDH1A1 (0.37) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL11991270 0.81 ALDH1A1 (0.34) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL10279744 0.81 ALDH1A1 (0.41) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL11991790 0.80 PPM1B (0.39) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL12019102 0.80 ALDH1A1 (0.40) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL10239122 0.77 ALDH1A1 (0.38) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL12239454 0.74 LMNA (0.33) ALDH1A1MEN1KMT2AL3MBTL1TP53
SCHEMBL17012508 0.74 ALDH1A1 (0.36) ALDH1A1MEN1KMT2AL3MBTL1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120288796-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-11-15 US disclosed
EP-2492747-A2 Chemically amplified negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-08-29 EP disclosed
EP-2101217-B1 Sulfonium salt-containing polymer, resist compositon, and patterning process SHINETSU CHEMICAL CO (JP) 2011-05-11 EP disclosed