SCHEMBL12038832

SCHEMBL12038832

O=C(O[n+]1ccccc1)N1CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.44
POLB P06746 1/20 0.44
KMT2A Q03164 5/20 0.44
MEN1 O00255 4/20 0.44
SMN1; SMN2 Q16637 4/20 0.44
NPSR1 Q6W5P4 3/20 0.44
LMNA P02545 2/20 0.44
L3MBTL1 Q9Y468 1/20 0.41
HPGD P15428 1/20 0.40
GAA P10253 1/20 0.40
NPC1 O15118 2/20 0.39
MAPT P10636 2/20 0.38
HTT P42858 2/20 0.38
TSHR P16473 2/20 0.36
TDP1 Q9NUW8 1/20 0.36
USP2 O75604 1/20 0.36
HSD11B1 P28845 1/20 0.36
RAB9A P51151 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12038843 0.83 KMT2A (0.59) ALDH1A1POLBKMT2AMEN1SMN1; SMN2
SCHEMBL10702619 0.81 TP53 (0.49) KMT2AMEN1SMN1; SMN2NPSR1LMNA
SCHEMBL12039007 0.79 ALDH1A1 (0.47) ALDH1A1POLBKMT2AMEN1SMN1; SMN2
SCHEMBL12038923 0.79 ALDH1A1 (0.47) ALDH1A1POLBKMT2AMEN1SMN1; SMN2
SCHEMBL12038823 0.77 HPGD (0.43) ALDH1A1POLBKMT2AMEN1SMN1; SMN2
SCHEMBL10490469 0.76 TP53 (0.47) POLBKMT2AMEN1SMN1; SMN2NPSR1
SCHEMBL12058578 0.76 L3MBTL1 (0.53) ALDH1A1POLBKMT2ASMN1; SMN2LMNA
SCHEMBL8292363 0.72 LMNA (0.58) ALDH1A1POLBKMT2AMEN1SMN1; SMN2
Iodide SCHEMBL31311261 0.72 KMT2A (0.40) ALDH1A1POLBKMT2AMEN1SMN1; SMN2
Benzene SCHEMBL27525227 0.71 ALDH1A1 (0.50) ALDH1A1POLBKMT2AMEN1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110318691-A1 RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed
US-20110318691-A1 RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed
US-20110318693-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110318691-A1 RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME RIF1, MSI2, SLIRP ALDH1A1 4155/4885POLB 512/4885KMT2A 774/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.