SCHEMBL12050697

SCHEMBL12050697

NC(=O)c1nnc(C(=O)O)[nH]1

nearest known ligand 0.37

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.37
KDM4E B2RXH2 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2C9 P11712 1/20 0.32
PTPRB P23467 1/20 0.32
HSD17B10 Q99714 1/20 0.32
PDPK1 O15530 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14091342 0.89 PDPK1 (0.36) PDPK1
SCHEMBL10752092 0.87 LMNA (0.44) LMNAKDM4ECYP3A4CYP2C9PTPRB
SCHEMBL2491301 0.75
Water SCHEMBL15332100 0.73 LMNA (0.35) LMNAKDM4ECYP3A4CYP2C9PTPRB
SCHEMBL20023168 0.70
SCHEMBL14770091 0.70
SCHEMBL4858369 0.70
SCHEMBL11588433 0.70
SCHEMBL2941533 0.70
SCHEMBL12050702 0.70 F2 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8083964-B2 Using amino acid derivative and surfactant as polishing mixture FUJIFILM CORPORATION (JP) 2011-12-27 US disclosed
US-20080242090-A1 Using amino acid derivative and surfactant as polishing mixture FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080206995-A1 METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-20080206995-A1 METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed