SCHEMBL12067130

SCHEMBL12067130

CCC1C2CC(CC(O)(C(F)(F)F)C(F)(F)F)C(C2)C1CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14278499 0.83 — —
SCHEMBL14278497 0.77 — —
SCHEMBL14149942 0.77 — —
SCHEMBL108134 0.76 — —
SCHEMBL16687971 0.76 — —
SCHEMBL21339598 0.74 — —
SCHEMBL10241242 0.73 — —
SCHEMBL14613975 0.73 — —
SCHEMBL12009317 0.73 — —
SCHEMBL12836391 0.73 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2011149035-A1 PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FUJIFILM CORPORATION (JP) 2011-12-01 — — WO disclosed
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