SCHEMBL21339598

SCHEMBL21339598

CCCC1C2CCC1C(CC(O)(C(F)(F)F)C(F)(F)F)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12836391 0.81 — —
SCHEMBL21325607 0.79 — —
SCHEMBL19558274 0.76 THRB (0.32) —
SCHEMBL12067130 0.74 — —
SCHEMBL10083289 0.71 CA1 (0.42) —
SCHEMBL2618657 0.71 — —
SCHEMBL108134 0.70 — —
SCHEMBL20926052 0.70 — —
SCHEMBL16687971 0.70 — —
SCHEMBL23383199 0.70 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2019171188-A1 PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-09-12 — — WO disclosed
Send feedback