Predicted protein targets (top 2)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 2/20 | 0.37 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1627910 | 0.90 | CYP4F2 (0.35) | CYP4F2CYP4A11 | |
| SCHEMBL11913018 | 0.87 | CYP4F2 (0.37) | CYP4F2CYP4A11 | |
| SCHEMBL15113939 | 0.82 | CYP4F2 (0.41) | CYP4F2CYP4A11 | |
| SCHEMBL26834190 | 0.81 | CYP4F2 (0.38) | CYP4F2CYP4A11 | |
| SCHEMBL13995978 | 0.80 | CYP4F2 (0.42) | CYP4F2CYP4A11 | |
| SCHEMBL13667082 | 0.80 | CYP4F2 (0.42) | CYP4F2CYP4A11 | |
| SCHEMBL2735048 | 0.79 | CYP4F2 (0.35) | CYP4F2CYP4A11 | |
| SCHEMBL14649721 | 0.79 | CYP4F2 (0.42) | CYP4F2CYP4A11 | |
| SCHEMBL25667373 | 0.79 | CYP4F2 (0.37) | CYP4F2CYP4A11 | |
| SCHEMBL1628316 | 0.79 | CYP4F2 (0.33) | CYP4F2CYP4A11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11754922-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-9926462-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-20170115570-A1 | RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER | JSR CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170073541-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-9540535-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2017-01-10 | — | — | US | disclosed |
| US-20160185999-A1 | RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER | JSR CORPORATION (JP) | 2016-06-30 | — | — | US | disclosed |
| US-9250529-B2 | Photoresist compositions and methods of use in high index immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-02-02 | — | — | US | disclosed |
| US-8541160-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20130217850-A1 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, AND POLYMER | JSR CORPORATION (JP) | 2013-08-22 | — | — | US | disclosed |
| US-20120288797-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-15 | — | — | US | disclosed |
| US-20110269072-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |