Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.31 |
| ▸ | HCRTR2 | O43614 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12249425 | 0.83 | CYP2C9 (0.32) | CA2 | |
| SCHEMBL345860 | 0.80 | HCRTR1 (0.35) | CA2HCRTR1HCRTR2 | |
| SCHEMBL8169843 | 0.80 | HCRTR1 (0.35) | CA2HCRTR1HCRTR2 | |
| SCHEMBL346996 | 0.80 | HCRTR1 (0.35) | CA2HCRTR1HCRTR2 | |
| SCHEMBL346997 | 0.80 | HCRTR1 (0.35) | CA2HCRTR1HCRTR2 | |
| SCHEMBL25387433 | 0.80 | HCRTR1 (0.35) | CA2HCRTR1HCRTR2 | |
| SCHEMBL18302566 | 0.80 | HCRTR1 (0.35) | CA2HCRTR1HCRTR2 | |
| SCHEMBL18682065 | 0.80 | HCRTR1 (0.35) | CA2HCRTR1HCRTR2 | |
| SCHEMBL2757765 | 0.79 | PABPC1 (0.34) | — | |
| SCHEMBL9332338 | 0.79 | HCRTR1 (0.35) | CA2HCRTR1HCRTR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110269071-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-20110269071-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-7435527-B2 | Mixture of acid generator and resin insoluble in alkaline developer and another acid decomposable compound | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-7435527-B2 | Mixture of acid generator and resin insoluble in alkaline developer and another acid decomposable compound | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |