Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PABPC1 | P11940 | 1/20 | 0.34 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9331683 | 0.79 | PABPC1 (0.32) | PABPC1CTDSP1GAA | |
| SCHEMBL12116752 | 0.79 | CA2 (0.32) | — | |
| SCHEMBL19714171 | 0.76 | PABPC1 (0.38) | PABPC1CTDSP1GAA | |
| SCHEMBL15756122 | 0.76 | PABPC1 (0.38) | PABPC1CTDSP1GAA | |
| SCHEMBL19714170 | 0.76 | PABPC1 (0.38) | PABPC1CTDSP1GAA | |
| SCHEMBL16807931 | 0.76 | PABPC1 (0.38) | PABPC1CTDSP1GAA | |
| SCHEMBL2757785 | 0.76 | PABPC1 (0.38) | PABPC1CTDSP1GAA | |
| SCHEMBL5595617 | 0.76 | PABPC1 (0.38) | PABPC1CTDSP1GAA | |
| SCHEMBL2757796 | 0.74 | PABPC1 (0.39) | PABPC1CTDSP1GAA | |
| SCHEMBL1487324 | 0.73 | PABPC1 (0.39) | PABPC1CTDSP1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8541161-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8541161-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20120003586-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20120003586-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110269071-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-20110269071-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-7235341-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |