SCHEMBL12119478

SCHEMBL12119478

Cc1cnc(-c2nc3ccccc3[nH]2)s1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 9/20 0.60
▸ RAB9A P51151 9/20 0.60
▸ ALDH1A1 P00352 9/20 0.60
▸ KDM4E B2RXH2 9/20 0.60
▸ HPGD P15428 8/20 0.60
▸ SMN1; SMN2 Q16637 7/20 0.60
▸ HSD17B10 Q99714 6/20 0.60
▸ TP53 P04637 4/20 0.60
▸ NFKB1 P19838 1/20 0.60
▸ NFKB2 Q00653 1/20 0.60
▸ RELA Q04206 1/20 0.60
▸ PKM P14618 3/20 0.55
▸ NPSR1 Q6W5P4 3/20 0.55
▸ ABCB11 O95342 1/20 0.55
▸ HTT P42858 1/20 0.51
▸ ADORA3 P0DMS8 2/20 0.50
▸ ADORA2A P29274 1/20 0.50
▸ ADORA1 P30542 1/20 0.50
▸ PDE10A Q9Y233 1/20 0.49
▸ PKN1 Q16512 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8343375 0.79 NPC1 (0.58) NPC1RAB9AALDH1A1KDM4EHPGD
SCHEMBL11884806 0.76 MMP2 (0.53) NPC1RAB9AALDH1A1KDM4EHPGD
SCHEMBL3336113 0.76 NPC1 (1.00) NPC1RAB9AALDH1A1KDM4EHPGD
SCHEMBL4275399 0.73 ALDH1A1 (0.64) NPC1RAB9AALDH1A1KDM4EHPGD
SCHEMBL30561047 0.73 NPC1 (1.00) NPC1RAB9AALDH1A1KDM4EHPGD
SCHEMBL30634854 0.73 NPC1 (1.00) NPC1RAB9AALDH1A1KDM4EHPGD
SCHEMBL172216 0.73 NPC1 (1.00) NPC1RAB9AALDH1A1KDM4EHPGD
SCHEMBL824391 0.72 NPC1 (0.60) NPC1RAB9AALDH1A1KDM4EHPGD
Water SCHEMBL9817804 0.71 NPC1 (0.95) NPC1RAB9AALDH1A1KDM4EHPGD
SCHEMBL1021801 0.71 METAP1 (0.67) NPC1RAB9AALDH1A1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110269071-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-11-03 — — US disclosed
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