SCHEMBL12125205

SCHEMBL12125205

CCC(CC(C)C(=O)Nc1ccccc1)C(=O)Nc1ccccc1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 5/20 0.55
▸ MEN1 O00255 4/20 0.55
▸ SMN1; SMN2 Q16637 2/20 0.49
▸ TSHR P16473 1/20 0.49
▸ ALDH1A1 P00352 2/20 0.48
▸ MAPT P10636 2/20 0.48
▸ MAPK1 P28482 1/20 0.48
▸ HPGD P15428 1/20 0.48
▸ CA1 P00915 3/20 0.47
▸ CA2 P00918 3/20 0.47
▸ CA7 P43166 3/20 0.47
▸ CA14 Q9ULX7 3/20 0.47
▸ GAA P10253 2/20 0.47
▸ MME P08473 1/20 0.46
▸ ACE P12821 1/20 0.46
▸ CRHBP P24387 1/20 0.44
▸ RAB9A P51151 1/20 0.44
▸ CRHR2 Q13324 1/20 0.44
▸ NPSR1 Q6W5P4 1/20 0.44
▸ KDM4E B2RXH2 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20319938 0.84 TSHR (0.56) KMT2AMEN1SMN1; SMN2TSHRMAPT
SCHEMBL20332450 0.82 TSHR (0.70) KMT2AMEN1SMN1; SMN2TSHRMAPT
SCHEMBL12125203 0.82 MEN1 (0.56) KMT2AMEN1SMN1; SMN2TSHRALDH1A1
SCHEMBL10027975 0.80 KDM4E (0.63) KMT2AMEN1TSHRALDH1A1MAPT
SCHEMBL14643391 0.80 KDM4E (0.63) KMT2AMEN1TSHRALDH1A1MAPT
SCHEMBL10027979 0.79 KDM4E (0.57) KMT2AMEN1TSHRALDH1A1MAPT
SCHEMBL4681925 0.77 MEN1 (0.86) KMT2AMEN1SMN1; SMN2TSHRALDH1A1
SCHEMBL12205972 0.75 MME (0.63) KMT2AMEN1SMN1; SMN2ALDH1A1MAPT
SCHEMBL18456226 0.75 MME (0.63) KMT2AMEN1SMN1; SMN2ALDH1A1MAPT
SCHEMBL4151615 0.75 MME (0.63) KMT2AMEN1SMN1; SMN2ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110281217-A1 NEGATIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND METHOD FOR PATTERNING USING THE SAME NEC CORPORATION (JP) 2011-11-17 — — US disclosed
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