SCHEMBL20319938

SCHEMBL20319938

CCC(CC(C)C)C(=O)Nc1ccccc1O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 1/20 0.56
▸ MAPT P10636 4/20 0.53
▸ CA1 P00915 2/20 0.53
▸ CA2 P00918 2/20 0.53
▸ RAB9A P51151 2/20 0.53
▸ CA7 P43166 1/20 0.53
▸ CA14 Q9ULX7 1/20 0.53
▸ CRHBP P24387 1/20 0.53
▸ CRHR2 Q13324 1/20 0.53
▸ NPSR1 Q6W5P4 1/20 0.53
▸ HPGD P15428 1/20 0.51
▸ GAA P10253 6/20 0.50
▸ KMT2A Q03164 5/20 0.50
▸ MEN1 O00255 3/20 0.50
▸ L3MBTL1 Q9Y468 2/20 0.45
▸ KDM4E B2RXH2 2/20 0.43
▸ TDP1 Q9NUW8 1/20 0.43
▸ MAPK1 P28482 1/20 0.43
▸ LMNA P02545 2/20 0.42
▸ HTT P42858 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20332450 0.89 TSHR (0.70) TSHRMAPTCA1CA2RAB9A
SCHEMBL12125203 0.86 MEN1 (0.56) TSHRMAPTRAB9ACRHBPCRHR2
SCHEMBL19849852 0.86 CA1 (0.52) TSHRMAPTCA1CA2RAB9A
SCHEMBL12125205 0.84 KMT2A (0.55) TSHRMAPTCA1CA2RAB9A
SCHEMBL14643391 0.81 KDM4E (0.63) TSHRMAPTCA1CA2RAB9A
SCHEMBL10027975 0.81 KDM4E (0.63) TSHRMAPTCA1CA2RAB9A
SCHEMBL7723381 0.77 GAA (0.59) TSHRMAPTCA1CA2RAB9A
SCHEMBL10447471 0.77 TP53 (0.67) MAPTRAB9ACRHBPCRHR2NPSR1
SCHEMBL26792805 0.76 GAA (0.54) TSHRMAPTCA1CA2RAB9A
SCHEMBL10027979 0.76 KDM4E (0.57) TSHRMAPTCA1CA2NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10725377-B2 Chemically amplified negative resist composition and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-28 — — US disclosed
US-20180180998-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-28 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180180998-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SLC11A2, POLR2B, POLI TSHR 4408/4885MAPT 3178/4885CA1 1523/4885
US-10725377-B2 Chemically amplified negative resist composition and resist pattern forming process SLC11A2, POLR2B, POLI TSHR 4408/4885MAPT 3178/4885CA1 1523/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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