Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 17/20 | 0.56 |
| ▸ | CA2 | P00918 | 17/20 | 0.56 |
| ▸ | MMP1 | P03956 | 1/20 | 0.48 |
| ▸ | MMP2 | P08253 | 1/20 | 0.48 |
| ▸ | MMP9 | P14780 | 1/20 | 0.48 |
| ▸ | MMP8 | P22894 | 1/20 | 0.48 |
| ▸ | MMP13 | P45452 | 1/20 | 0.48 |
| ▸ | F2 | P00734 | 1/20 | 0.39 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.39 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.39 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.37 |
| ▸ | CA7 | P43166 | 1/20 | 0.37 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.37 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.34 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.34 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20439590 | 0.88 | CA1 (0.44) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL22484603 | 0.88 | CA1 (0.48) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL20415014 | 0.88 | CA1 (0.44) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL13588295 | 0.87 | CA1 (0.52) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL25117857 | 0.84 | CA1 (0.39) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL25068896 | 0.83 | CA1 (0.52) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL24445822 | 0.83 | CA1 (0.52) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL2347469 | 0.80 | CA1 (0.71) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL25068916 | 0.79 | CA1 (0.48) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL26430396 | 0.79 | CA1 (0.48) | CA1CA2MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12199239-B2 | Sulfonimide salts for battery applications | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2025-01-14 | — | — | US | disclosed |
| US-20240021874-A1 | Sulfonimide Salts for Battery Applications | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2024-01-18 | — | — | US | disclosed |
| US-11796912-B2 | Radiation-sensitive composition and pattern-forming method | JSR CORPORATION (JP) | 2023-10-24 | — | — | US | disclosed |
| US-11711934-B2 | Metal amides for use as HIL for an organic light-emitting diode (OLED) | NOVALED GMBH (DE) | 2023-07-25 | — | — | US | disclosed |
| US-20230217677-A1 | Organic Electronic Device Comprising a Substrate, an Anode Layer, a Cathode Layer, at Least One First Emission Layer, and a Hole Injection Layer That Comprises a Metal Complex | NOVALED GMBH (DE) | 2023-07-06 | — | — | US | disclosed |
| US-20230217677-A1 | Organic Electronic Device Comprising a Substrate, an Anode Layer, a Cathode Layer, at Least One First Emission Layer, and a Hole Injection Layer That Comprises a Metal Complex | NOVALED GMBH (DE) | 2023-07-06 | — | — | US | disclosed |
| US-20230131369-A1 | An Organic Electronic Device Comprising a Hole Injection Layer That Comprises a Hole Transport Compound | NOVALED GMBH (DE) | 2023-04-27 | — | — | US | disclosed |
| US-20230131369-A1 | An Organic Electronic Device Comprising a Hole Injection Layer That Comprises a Hole Transport Compound | NOVALED GMBH (DE) | 2023-04-27 | — | — | US | disclosed |
| US-20230126203-A1 | An Organic Electronic Device Comprising an Anode Layer, a Cathode Layer, at Least One Emission Layer (EML) and at Least One Hole Injection Layer (HIL) | NOVALED GMBH (DE) | 2023-04-27 | — | — | US | disclosed |
| US-20230126203-A1 | An Organic Electronic Device Comprising an Anode Layer, a Cathode Layer, at Least One Emission Layer (EML) and at Least One Hole Injection Layer (HIL) | NOVALED GMBH (DE) | 2023-04-27 | — | — | US | disclosed |
| US-20080090972-A1 | Oligomers and Polymers Containing Sulfinate Groups, and Methods for Producing the Same | KERRES JOCHEN | 2008-04-17 | — | — | US | disclosed |
| US-7303852-B2 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | disclosed |
| US-7303852-B2 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | disclosed |
| US-7288599-B2 | Oligomers and polymers containing sulfinate groups, and method for producing the same | KERRES JOCHEN | 2007-10-30 | — | — | US | disclosed |
| US-7288599-B2 | Oligomers and polymers containing sulfinate groups, and method for producing the same | KERRES JOCHEN | 2007-10-30 | — | — | US | disclosed |
| US-20070160815-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |
| US-20070160815-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |
| US-20070111140-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070065752-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-22 | — | — | US | disclosed |
| US-20070065752-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12199239-B2 | Sulfonimide salts for battery applications | TST, EWSR1, SCLY | CA1 526/4885CA2 516/4885MMP1 2211/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.