SCHEMBL12130508

SCHEMBL12130508

CCC(C)(C)C(=O)OCCC[Si](C)(OC)OC

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.33
CYP4A11 Q02928 1/20 0.33
FKBP1A P62942 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12626349 0.90 CYP4F2 (0.32) CYP4F2CYP4A11
SCHEMBL15356149 0.87 CYP4F2 (0.33) CYP4F2CYP4A11FKBP1A
SCHEMBL17480216 0.85 CYP4F2 (0.33) CYP4F2CYP4A11FKBP1A
SCHEMBL12130504 0.85 CYP4F2 (0.36) CYP4F2CYP4A11
SCHEMBL278638 0.85 CYP4F2 (0.34) CYP4F2CYP4A11FKBP1A
SCHEMBL107666 0.84 CYP4F2 (0.36) CYP4F2CYP4A11FKBP1A
SCHEMBL12611126 0.84 POLB (0.36)
SCHEMBL25760896 0.84 CYP4F2 (0.32) CYP4F2CYP4A11FKBP1A
SCHEMBL18014664 0.83 CYP4F2 (0.35) CYP4F2CYP4A11FKBP1A
SCHEMBL18014657 0.83 CYP4F2 (0.35) CYP4F2CYP4A11FKBP1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11708479-B2 Resin composition, film, near infrared cut filter, infrared transmitting filter, solid image pickup element, image display device, infrared sensor, and camera module FUJIFILM CORPORATION (JP) 2023-07-25 US disclosed
US-20180188428-A1 NEAR-INFRARED CUT FILTER, METHOD FOR PRODUCING NEAR-INFRARED CUT FILTER, AND SOLID-STATE IMAGING ELEMENT FUJIFILM CORPORATION (JP) 2018-07-05 US disclosed
US-20180175090-A1 NEAR INFRARED ABSORBING COMPOSITION, FILM, NEAR INFRARED CUT FILTER, AND SOLID IMAGE PICKUP ELEMENT FUJIFILM CORPORATION (JP) 2018-06-21 US disclosed
US-20180163022-A1 NEAR INFRARED ABSORBING CURABLE COMPOSITION, CURED FILM, SOLID IMAGE PICKUP ELEMENT, INFRARED ABSORBER, AND COMPOUND FUJIFILM CORPORATION (JP) 2018-06-14 US disclosed
US-9971245-B2 Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-15 US disclosed
US-9958576-B2 Near infrared ray absorbent composition, near infrared ray cut filter, manufacturing method of near infrared ray cut filter, solid image pickup element, camera module FUJIFILM CORPORATION (JP) 2018-05-01 US disclosed
US-9822330-B2 Light-degradable material, substrate, and method for patterning the substrate NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-11-21 US disclosed
US-20170227690-A1 NEAR INFRARED RAY ABSORBENT COMPOSITION, NEAR INFRARED RAY CUT FILTER, SOLID IMAGE PICKUP ELEMENT, AND CAMERA MODULE FUJIFILM CORPORATION (JP) 2017-08-10 US disclosed
US-20170102483-A1 NEAR INFRARED RAY ABSORBENT COMPOSITION, NEAR INFRARED RAY CUT FILTER, MANUFACTURING METHOD OF NEAR INFRARED RAY CUT FILTER, SOLID IMAGE PICKUP ELEMENT, CAMERA MODULE FUJIFILM CORPORATION (JP) 2017-04-13 US disclosed
US-9546257-B2 Porous carbon-heteroatom-silicon inorganic/organic materials for chromatographic separations and process for the preparation thereof WATERS TECHNOLOGIES CORPORATION (US) 2017-01-17 US disclosed
US-9120083-B2 Porous inorganic/organic hybrid particles having high organic content and enhanced pore geometry for chromatographic separations WATERS TECHNOLOGIES CORPORATION (US) 2015-09-01 US disclosed
US-8992790-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-03-31 US disclosed
US-8932953-B2 Composition for forming a silicon-containing resist underlayer film and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-01-13 US disclosed
US-20140228464-A1 POROUS CARBON-HETEROATOM-SILICON INORGANIC/ORGANIC MATERIALS FOR CHROMATOGRAPHIC SEPARATIONS AND PROCESS FOR THE PREPARATION THEREOF WATERS TECHNOLOGIES CORPORATION (US) 2014-08-14 US disclosed
US-20130284699-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-10-31 US disclosed
US-20130284698-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-10-31 US disclosed
US-8063162-B2 Polymer for an ink receiving layer of an inkjet recording element HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2011-11-22 US disclosed
US-20110160416-A1 POLYMER FOR AN INK RECEIVING LAYER OF AN INKJET RECORDING ELEMENT CHEN TIENTEH 2011-06-30 US disclosed
US-7923117-B2 first monomer of the polymer includes at least one amine functional group; aminoethylmethacrylate; aminoethylacrylate; second monomer includes a carbon backbone having at least one silane functional group pendant; prevent dye from migrating HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2011-04-12 US disclosed
US-20080182936-A1 POLYMER FOR AN INK RECEIVING LAYER OF AN INKJET RECORDING ELEMENT HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2008-07-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180163022-A1 NEAR INFRARED ABSORBING CURABLE COMPOSITION, CURED FILM, SOLID IMAGE PICKUP ELEMENT, INFRARED ABSORBER, AND COMPOUND H1-0, PEAK1, CHRM1 CYP4F2 2326/4885CYP4A11 2691/4885FKBP1A 3001/4885
US-20170227690-A1 NEAR INFRARED RAY ABSORBENT COMPOSITION, NEAR INFRARED RAY CUT FILTER, SOLID IMAGE PICKUP ELEMENT, AND CAMERA MODULE C9, SET, CRY1 CYP4F2 2440/4885CYP4A11 3570/4885FKBP1A 780/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.