Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.30 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13058434 | 0.81 | — | — | |
| SCHEMBL76555 | 0.72 | — | — | |
| SCHEMBL18785663 | 0.72 | — | — | |
| SCHEMBL1218407 | 0.71 | ALDH1A1 (0.41) | ALDH1A1TDP1HTT | |
| SCHEMBL1215732 | 0.71 | SMN1; SMN2 (0.34) | ALDH1A1TDP1 | |
| SCHEMBL7360243 | 0.71 | ALDH1A1 (0.41) | ALDH1A1TDP1HTT | |
| SCHEMBL10485411 | 0.71 | ALDH1A1 (0.41) | ALDH1A1TDP1HTT | |
| SCHEMBL14593908 | 0.68 | HTT (0.33) | HTT | |
| SCHEMBL11721786 | 0.68 | ALDH1A1 (0.38) | ALDH1A1TDP1HTT | |
| SCHEMBL22666980 | 0.68 | ALDH1A1 (0.38) | ALDH1A1TDP1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8530134-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8470510-B2 | Polymer for lithographic purposes and method for producing same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| EP-1354897-B1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | DAICEL CHEM (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-20110065044-A1 | POLYMER FOR LITHOGRAPHIC PURPOSES AND METHOD FOR PRODUCING SAME | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110040056-A1 | PROCESS FOR PRODUCTION OF POLYMER | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20100297551-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-7407733-B2 | Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.04,8] nonan-3-one ring and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-05 | — | — | US | disclosed |
| US-20060281022-A1 | Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0 4.8] nonan-3-one ring and photoresist resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-14 | — | — | US | disclosed |
| US-7105268-B2 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| EP-1681307-A1 | POLYMERIC COMPOUND CONTAINING REPEATING UNIT HAVING 2-OXATRICYCLO[4.2.1.04,8]NONAN-3-ONE RING, AND PHOTORESIST RESIN COMPOSITION | Daicel Chemical Industries, Ltd. (JP) | 2006-07-19 | — | — | EP | disclosed |
| US-6924079-B2 | Resist resin, chemical amplification type resist, and method of forming of pattern with the same | NEC CORPORATION (JP) | 2005-08-02 | — | — | US | disclosed |
| US-20030211734-A1 | Resist resin, chemical amplification type resist, and method of forming of pattern with the same | NEC CORPORATION (JP) | 2003-11-13 | — | — | US | disclosed |
| EP-1354897-A1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | Daicel Chemical Industries, Ltd. (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |
| US-4073933-A | ANTIULCER, ANTISECRETORY, CNS REGULATORS, AND LABOR INDUCERS | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1978-02-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | LCP1, DOT1L, PRMT1 | ALDH1A1 1006/4885TDP1 2245/4885HTT 2500/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.