Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.35 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | RECQL | P46063 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | USP2 | O75604 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7360243 | 1.00 | ALDH1A1 (0.41) | ALDH1A1TDP1RAB9AMEN1KMT2A | |
| SCHEMBL10485411 | 1.00 | ALDH1A1 (0.41) | ALDH1A1TDP1RAB9AMEN1KMT2A | |
| SCHEMBL23106949 | 0.85 | ALDH1A1 (0.40) | ALDH1A1TDP1RAB9AMEN1KMT2A | |
| SCHEMBL7663419 | 0.83 | POLB (0.35) | ALDH1A1TDP1KMT2ARECQLL3MBTL1 | |
| SCHEMBL3781306 | 0.83 | POLB (0.35) | ALDH1A1TDP1KMT2ARECQLL3MBTL1 | |
| SCHEMBL14566116 | 0.80 | ALDH1A1 (0.34) | ALDH1A1TDP1RAB9AMEN1KMT2A | |
| SCHEMBL1217695 | 0.80 | ALDH1A1 (0.38) | ALDH1A1TDP1RAB9AMEN1KMT2A | |
| SCHEMBL18906485 | 0.77 | ALDH1A1 (0.32) | ALDH1A1TDP1SMN1; SMN2L3MBTL1 | |
| SCHEMBL11721786 | 0.72 | ALDH1A1 (0.38) | ALDH1A1TDP1RAB9AMEN1KMT2A | |
| SCHEMBL22666980 | 0.72 | ALDH1A1 (0.38) | ALDH1A1TDP1RAB9AMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 174 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230279170-A1 | CHIRAL-SUBSTITUTED POLY-N-VINYLPYRROLIDINONES AND COMPLEXES WITH BIMETALLIC NANOCLUSTERS AND USES THEREOF | KANSAS STATE UNIVERSITY RESEARCH FOUNDATION | 2023-09-07 | — | — | US | disclosed |
| US-20230279170-A1 | CHIRAL-SUBSTITUTED POLY-N-VINYLPYRROLIDINONES AND COMPLEXES WITH BIMETALLIC NANOCLUSTERS AND USES THEREOF | KANSAS STATE UNIVERSITY RESEARCH FOUNDATION | 2023-09-07 | — | — | US | disclosed |
| US-20200115400-A1 | METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-04-16 | — | — | US | disclosed |
| EP-2045280-B1 | RING-OPENING METATHESIS POLYMERS, PRODUCTS OF HYDROGENATION THEREOF, PROCESS FOR PRODUCTION OF THE SAME AND USES THEREOF | MITSUI CHEMICALS INC (JP) | 2018-10-10 | — | — | EP | disclosed |
| US-9927708-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9910358-B2 | Patterning process and chemically amplified negative resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-06 | — | — | US | disclosed |
| US-9823563-B2 | Alcohol compound and method for producing same, method for producing lactone compound, (meth)acrylate ester and method for producing same, polymer and method for producing same, and resist composition and method for producing substrate using same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-11-21 | — | — | US | disclosed |
| US-9823563-B2 | Alcohol compound and method for producing same, method for producing lactone compound, (meth)acrylate ester and method for producing same, polymer and method for producing same, and resist composition and method for producing substrate using same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-11-21 | — | — | US | disclosed |
| US-9709890-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-07-18 | — | — | US | disclosed |
| US-9709890-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-07-18 | — | — | US | disclosed |
| US-6605408-B2 | Hydrogenated polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-08-12 | — | — | US | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1275676-A1 | HYDROGENATED RING-OPENING METATHESIS COPOLYMER AND PROCESS FOR PRODUCING THE SAME | Mitsui Chemicals, Inc. (JP) | 2003-01-15 | — | — | EP | disclosed |
| US-20030004289-A1 | Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-01-02 | — | — | US | disclosed |
| US-20020165328-A1 | Hydrogenated ring-opening metathesis copolymer and process for producing the same | MITSUI CHEMICALS, INC. (JP) | 2002-11-07 | — | — | US | disclosed |
| JP-2002205989-A | METHOD FOR PRODUCING 4-OXATRICYCLO[5.2.1.02,6]DECAN-8-EN-5-ONE | DAICEL CHEM IND LTD | 2002-07-23 | — | — | JP | disclosed |
| JP-2002205989-A | METHOD FOR PRODUCING 4-OXATRICYCLO[5.2.1.02,6]DECAN-8-EN-5-ONE | DAICEL CHEM IND LTD | 2002-07-23 | — | — | JP | disclosed |
| US-20020001772-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-03 | — | — | US | disclosed |
| EP-1047686-A1 | SUBSTITUTED BICYCLIC LACTONES | Bayer Aktiengesellschaft (DE) | 2000-11-02 | — | — | EP | disclosed |
| WO-1999036418-A1 | SUBSTITUTED BICYCLIC LACTONES | BAYER AKTIENGESELLSCHAFT (DE) | 1999-07-22 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | LCP1, DOT1L, PRMT1 | ALDH1A1 1006/4885TDP1 2245/4885RAB9A 3266/4885 |
| US-20200115400-A1 | METHOD FOR PRODUCING SILICON COMPOUND, AND SILICON COMPOUND | SI, SIK1, CA1 | ALDH1A1 881/4885TDP1 4103/4885RAB9A 3202/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.