Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10180173 | 0.84 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL1218545 | 0.84 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL685840 | 0.84 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL18720924 | 0.84 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL686170 | 0.81 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL17534907 | 0.81 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL1217561 | 0.80 | KDM4E (0.32) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL685664 | 0.80 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL21432112 | 0.80 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL19996962 | 0.80 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8753793-B2 | Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8530134-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8470510-B2 | Polymer for lithographic purposes and method for producing same | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20110244394-A1 | METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST COMPOSITION, AND PATTERN-FORMING METHOD | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110065044-A1 | POLYMER FOR LITHOGRAPHIC PURPOSES AND METHOD FOR PRODUCING SAME | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110040056-A1 | PROCESS FOR PRODUCTION OF POLYMER | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20100297551-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |