SCHEMBL12256299

SCHEMBL12256299

O=S(=O)(C(F)F)N1CCC2(CCCCC2)CC1

nearest known ligand 0.36

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 5/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
CYP2C19 P33261 3/20 0.36
TSHR P16473 3/20 0.34
CTSS P25774 1/20 0.32
CTSK P43235 1/20 0.32
ACLY P53396 1/20 0.32
CYP3A4 P08684 5/20 0.32
CYP2C9 P11712 4/20 0.31
USP2 O75604 4/20 0.31
SPR P35270 2/20 0.31
MAPK1 P28482 1/20 0.31
ALDH1A1 P00352 2/20 0.31
LMNA P02545 1/20 0.31
MAPT P10636 1/20 0.31
HTT P42858 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
CYP1A2 P05177 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12256257 0.78 CA1 (0.48) CYP2C19TSHRCYP3A4CYP2C9USP2
SCHEMBL12256287 0.78 CA1 (0.48) CYP2C19TSHRCYP3A4CYP2C9USP2
SCHEMBL10252288 0.78 CA1 (0.48) CYP2C19TSHRCYP3A4CYP2C9USP2
SCHEMBL12256291 0.75 CA1 (0.43) SMN1; SMN2CYP2C19TSHRCYP3A4CYP2C9
SCHEMBL1371388 0.74 CA1 (0.56) CYP2D6SMN1; SMN2CYP2C19TSHRACLY
SCHEMBL8225935 0.74 TSHR (0.38) CYP2D6SMN1; SMN2CYP2C19TSHRACLY
SCHEMBL18572479 0.73 CTSS (0.34) CYP2D6SMN1; SMN2CYP2C19TSHRCTSS
SCHEMBL8225915 0.72 CYP2D6 (0.39) CYP2D6SMN1; SMN2CYP2C19TSHRACLY
SCHEMBL15503069 0.72 CYP2D6 (0.56) CYP2D6SMN1; SMN2CYP2C19TSHRCYP3A4
SCHEMBL347200 0.72 CYP2D6 (0.37) CYP2D6SMN1; SMN2CYP2C19TSHRACLY

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170059992-A1 RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2017-03-02 US disclosed
US-8709704-B2 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method FUJIFILM CORPORATION (JP) 2014-04-29 US disclosed
US-20110229832-A1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2011-09-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110229832-A1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD RER1, RARA, RARG CYP2D6 3060/4885SMN1; SMN2 1967/4885CYP2C19 4335/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.