SCHEMBL1228489

SCHEMBL1228489

C=C[Si](C=C)(OCCCC)OCCCC

nearest known ligand 0.40

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.40
HPGD P15428 1/20 0.40
ALDH1A1 P00352 2/20 0.36
ADRB2 P07550 1/20 0.36
ADRB1 P08588 1/20 0.36
ADRB3 P13945 1/20 0.36
ATM Q13315 1/20 0.33
CYP3A4 P08684 1/20 0.32
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2781904 0.93 TSHR (0.37) TSHRHPGDALDH1A1CA1CA2
SCHEMBL117876 0.84 TSHR (0.30) TSHR
SCHEMBL4221286 0.80 TSHR (0.40) TSHRHPGDALDH1A1ADRB2ADRB1
SCHEMBL129087 0.80 TSHR (0.40) TSHRHPGDALDH1A1ADRB2ADRB1
SCHEMBL15302455 0.78 TSHR (0.39) TSHRHPGDALDH1A1ADRB2ADRB1
SCHEMBL198101 0.78 TSHR (0.39) TSHRHPGDALDH1A1ADRB2ADRB1
SCHEMBL537953 0.78 TSHR (0.39) TSHRHPGDALDH1A1ADRB2ADRB1
SCHEMBL22654215 0.78
SCHEMBL20394649 0.78 TSHR (0.39) TSHRHPGDALDH1A1ADRB2ADRB1
SCHEMBL931015 0.76 TSHR (0.38) TSHRHPGDALDH1A1ADRB2ADRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115105868-A Organic silicon defoaming agent and preparation method thereof 佛山市南海大田化学有限公司 2022-09-27 CN claimed
CN-112126067-B Preparation method and application of liquid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2022-04-05 CN claimed
CN-112126064-B Preparation method of solid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2022-04-05 CN claimed
CN-112094414-B Preparation method of novel liquid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2022-01-07 CN claimed
CN-112126065-A Preparation method of solid silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-12-25 CN claimed
CN-112126067-A Preparation method and application of novel liquid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2020-12-25 CN claimed
CN-112126066-A Preparation method of polycarbosilane with high silicon-hydrogen content 宁波曙翔新材料股份有限公司 2020-12-25 CN claimed
CN-112126064-A Preparation method of novel solid silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-12-25 CN claimed
CN-111925386-B Preparation method of novel silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-12-22 CN claimed
CN-112094414-A Preparation method of novel liquid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2020-12-18 CN claimed
CN-111925386-A Preparation method of novel silicon carbide ceramic precursor 长沙科航特种织造有限公司 2020-11-13 CN claimed
CN-118843711-A Material for gas barrier film, silicon oxide film, and method for producing silicon oxide film 东曹株式会社 2024-10-25 CN disclosed
CN-115155113-B Structure for organic silicon defoamer and synthesis method thereof 佛山市南海大田化学有限公司 2023-09-29 CN disclosed
CN-115105868-B Organic silicon defoamer and preparation method thereof 佛山市南海大田化学有限公司 2023-07-18 CN disclosed
CN-112126065-B Preparation method of solid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2023-05-02 CN disclosed
US-6468589-B2 A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010012870-A1 Composition for film formation and insulating film JSR CORPORATION (JP) 2001-08-09 US disclosed
EP-1122746-A1 Composition for film formation and insulating film JSR Corporation (JP) 2001-08-08 EP disclosed
US-5662961-A Method for forming a protective coating film on electronic parts and devices TOKYO OHKA KOGYO CO., LTD. (JP) 1997-09-02 US disclosed
US-5520952-A Method for forming a protective coating film on electronic parts and devices TOKYO OHKA KOGYO CO., LTD. (JP) 1996-05-28 US disclosed