SCHEMBL1228667

SCHEMBL1228667

CCO[Si](C)(CCSCCN)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12794888 0.98
SCHEMBL12794802 0.88
SCHEMBL12972155 0.81 ALDH1A1 (0.35)
SCHEMBL1230316 0.81
SCHEMBL12190541 0.79
SCHEMBL2446917 0.78 CYP1A2 (0.30)
SCHEMBL483740 0.77
SCHEMBL9861470 0.76 PRKD3 (0.38)
SCHEMBL3923447 0.76
SCHEMBL7007451 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10208206-B2 Curable resin composition and cured product thereof, sealing material for optical semiconductor, die bonding material, and optical semiconductor light-emitting element ASAHI KASEI CHEMICALS CORPORATION (JP) 2019-02-19 US disclosed
US-20160115318-A1 Curable Resin Composition and Cured Product Thereof, Sealing Material for Optical Semiconductor, Die Bonding Material, and Optical Semiconductor Light-Emitting Element ASAHI KASEI CHEMICALS CORPORATION (JP) 2016-04-28 US disclosed
EP-2995634-A1 CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF, SEALING MATERIAL FOR OPTICAL SEMICONDUCTOR, DIE BONDING MATERIAL, AND OPTICAL SEMICONDUCTOR LIGHT-EMITTING ELEMENT Asahi Kasei Chemicals Corporation (JP) 2016-03-16 EP disclosed
US-8658346-B2 Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-25 US disclosed
EP-2128193-B1 POROUS POLYIMIDE IBIDEN CO LTD (JP) 2013-06-19 EP disclosed
US-8426105-B2 Resist-modifying composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 US disclosed
CN-102076734-B Modified resin composition, method for producing same, and curable resin composition containing same ASAHI KASEI CHEMICALS CORP (JP) 2013-02-27 CN disclosed
US-8367310-B2 Pattern forming process and resist-modifying composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-02-05 US disclosed
EP-2138525-B1 EPOXY SILICONE AND METHOD FOR PRODUCTION THEREOF, AND CURABLE RESIN COMPOSITION USING THE SAME AND USE THEREOF ASAHI KASEI CHEMICALS CORP (JP) 2012-12-26 EP disclosed
US-8329384-B2 Resist-modifying composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-11 US disclosed
EP-1086969-B1 NOVEL POLYISOCYANATE AND METHOD FOR PRODUCING THE SAME ASAHI CHEMICAL IND (JP) 2009-08-12 EP disclosed
US-6469122-B1 POLYISOCYANATE OBTAINED BY REACTING A DIISOCYANATE SELECTED FROM AN ALIPHATIC DIISOCYANATE AND AN ALICYCLIC DIISOCYANATE WITH A POLYOL HAVING A NUMBER AVERAGE MOLECULAR WEIGHT OF FROM 3,000 TO 30,000; CURABLE SEALANT ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-10-22 US disclosed
EP-0844283-B1 Curable resin composition and cured products JSR CORP (JP) 2002-10-09 EP disclosed
US-6313233-B1 CAN BE CURED AND FABRICATED WITHOUT PRODUCING NO CRACKS INTO A CURED PRODUCT SUCH AS A SEMICONDUCTOR DEVICE HAVING A LOW DIELECTRIC CONSTANT, HIGH HEAT RESISTANCE AND MOISTURE RESISTANCE, SUPERIOR ADHESION TO VARIOUS SUBSTRATE MATERIALS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-06 US disclosed
EP-1086969-A1 NOVEL POLYISOCYANATE AND PROCESS FOR PRODUCING THE SAME Asahi Kasei Kogyo Kabushiki Kaisha (JP) 2001-03-28 EP disclosed
US-6011123-A ORGANOSILANE COMPOUND; POLYAMIC ACIDS HAVING A HYDROLYZABLE SILYL GROUP OR CARBOXYLIC ACID ANHYDRIDE GROUP, OR BOTH, AND POLYIMIDES HAVING A HYDROLYZABLE SILYL GROUP OR CARBOXYLIC ACID ANHYDRIDE GROUP, OR BOTH. JSR CORPORATION (JP) 2000-01-04 US disclosed
EP-0844283-A1 Curable resin composition and cured products JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-05-27 EP disclosed
EP-0319911-B1 Laminated structure NIPPON SHEET GLASS CO LTD (JP) 1994-04-06 EP disclosed
US-4925737-A POLYESTER AND POLYVINYL BUTYRAL SHEETS LAMINATED WITH CURED ADHESIVE OF AMINOORGANOSILICON AND DIAMINE REACTION PRODUCT; SAFETY GLASS NIPPON SHEET GLASS CO., LTD. (JP) 1990-05-15 US disclosed
EP-0319911-A2 Laminated structure Nippon Sheet Glass Co., Ltd. (JP) 1989-06-14 EP disclosed