SCHEMBL12293170

SCHEMBL12293170

COc1ccc(/C(=N/OS(=O)(=O)C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.43
CA2 P00918 3/20 0.43
CES2 O00748 2/20 0.41
CES1 P23141 2/20 0.41
PDE4B Q07343 1/20 0.39
ALDH1A1 P00352 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
PARP1 P09874 1/20 0.39
PARP10 Q53GL7 1/20 0.39
PARP2 Q9UGN5 1/20 0.39
PARP4 Q9UKK3 1/20 0.39
CDK5 Q00535 2/20 0.38
CDK5R1 Q15078 2/20 0.38
HSD11B1 P28845 2/20 0.38
MAPT P10636 1/20 0.38
PKM P14618 1/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14199629 0.91 HSD11B1 (0.41) CA1CA2CES2CES1ALDH1A1
SCHEMBL547191 0.88 CES2 (0.41) CA1CA2CES2CES1ALDH1A1
SCHEMBL547190 0.88 CES2 (0.41) CA1CA2CES2CES1ALDH1A1
SCHEMBL4901370 0.87 CA1 (0.40) CA1CA2CES2CES1PDE4B
SCHEMBL19621094 0.87 CES2 (0.40) CA1CA2CES2CES1ALDH1A1
SCHEMBL14707484 0.86 CA2 (0.37) CA1CA2CES2CES1ALDH1A1
SCHEMBL546200 0.85 EP300 (0.45) CA1CA2CES2CES1ALDH1A1
SCHEMBL546201 0.85 EP300 (0.45) CA1CA2CES2CES1ALDH1A1
SCHEMBL546602 0.85 CA12 (0.44) CA1CA2PKM
SCHEMBL546603 0.85 CA12 (0.44) CA1CA2PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8753802-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-06-17 US disclosed
US-20130045365-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2013-02-21 US disclosed
WO-2011132764-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2011-10-27 WO disclosed
US-7202014-B2 Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition FUJIFILM CORPORATION (JP) 2007-04-10 US disclosed
US-7202014-B2 Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition FUJIFILM CORPORATION (JP) 2007-04-10 US disclosed