Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 3/20 | 0.41 |
| ▸ | CHRM4 known ✓ | P08173 | 1/20 | 0.33 |
| ▸ | CHRM1 known ✓ | P11229 | 1/20 | 0.33 |
| ▸ | CHRM3 known ✓ | P20309 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | BLM | P54132 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.32 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.32 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.32 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.32 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.32 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9712027 | 0.98 | ACHE (0.43) | ACHETSHRLMNABLMMAPT | |
| Hydrochloric Acid SCHEMBL26110882 | 0.95 | ACHE (0.41) | ACHETSHRLMNABLMMAPT | |
| Water SCHEMBL11596575 | 0.95 | ACHE (0.41) | ACHETSHRLMNABLMMAPT | |
| Sulfuric Acid SCHEMBL31286317 | 0.86 | LMNA (0.34) | ACHETSHRLMNAMAPTALDH1A1 | |
| SCHEMBL10777360 | 0.83 | TSHR (0.35) | ACHETSHRLMNABLMMAPT | |
| SCHEMBL2486358 | 0.82 | CHRNB4 (0.38) | ACHETSHRLMNAALDH1A1CHRM4 | |
| Hydrochloric Acid SCHEMBL11126825 | 0.80 | KMT2A (0.42) | LMNAALDH1A1HTTCHRM1CHRM3 | |
| Water SCHEMBL11439671 | 0.80 | DNM1 (0.40) | LMNAALDH1A1HTTCHRM1CHRM3 | |
| Hydrochloric Acid SCHEMBL11127290 | 0.78 | KMT2A (0.45) | LMNAALDH1A1HTTCHRM1CHRM3 | |
| Water SCHEMBL11441211 | 0.78 | DNM1 (0.42) | LMNAALDH1A1HTTCHRM1CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250204164-A1 | DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2025-06-19 | — | — | US | disclosed |
| CN-118923228-A | Display device and photosensitive composition | 东丽株式会社 | 2024-11-08 | — | — | CN | disclosed |
| WO-2023190218-A1 | DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION | 東レ株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-8445175-B2 | Composition containing hydroxylated condensation resin for forming resist underlayer film | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-05-21 | — | — | US | disclosed |
| EP-2042927-B1 | COMPOSITION CONTAINING HYDROXYLATED CONDENSATION RESIN FOR FORMING FILM UNDER RESIST | NISSAN CHEMICAL IND LTD (JP) | 2012-03-07 | — | — | EP | disclosed |
| US-20090317740-A1 | Composition containing hydroxylated condensation resin for forming resist underlayer film | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-24 | — | — | US | disclosed |
| EP-2042927-A1 | COMPOSITION CONTAINING HYDROXYLATED CONDENSATION RESIN FOR FORMING FILM UNDER RESIST | Nissan Chemical Industries, Ltd. (JP) | 2009-04-01 | — | — | EP | disclosed |