SCHEMBL12367102

SCHEMBL12367102

CC(=O)OC1OCCCC1C

nearest known ligand 0.37

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 5/20 0.35
CHRM1 P11229 3/20 0.35
CHRM4 P08173 2/20 0.35
CHRM3 P20309 2/20 0.35
TSHR P16473 1/20 0.34
KMT2A Q03164 4/20 0.33
LMNA P02545 2/20 0.32
POLB P06746 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
EPHX1 P07099 1/20 0.31
MEN1 O00255 3/20 0.31
MAPT P10636 1/20 0.31
CYP2D6 P10635 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21339599 0.81 CHRM2 (0.42) CHRM2CHRM1CHRM4CHRM3TSHR
SCHEMBL7912591 0.81 CHRM2 (0.42) CHRM2CHRM1CHRM4CHRM3TSHR
SCHEMBL5157578 0.79 CHRM2 (0.34) CHRM2CHRM1CHRM4CHRM3TSHR
SCHEMBL20229519 0.79 CHRM2 (0.34) CHRM2CHRM1CHRM4CHRM3TSHR
SCHEMBL18869517 0.79
SCHEMBL10385442 0.77 LMNA (0.42) CHRM2CHRM1TSHRKMT2ALMNA
SCHEMBL16591062 0.75 FKBP1A (0.32)
SCHEMBL7931705 0.74
SCHEMBL2739848 0.74
SCHEMBL30184336 0.73 CHRM2 (0.42) CHRM2CHRM1CHRM4CHRM3TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7998657-B2 Ester compounds and their preparation, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-16 US disclosed
US-7902385-B2 Ester compounds and their preparation, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-03-08 US disclosed
US-20110039204-A1 ESTER COMPOUNDS AND THEIR PREPARATION, POLYMERS, RESIST COMPOSITIONS AND PATTERNING PROCESS OHASHI MASAKI 2011-02-17 US disclosed
US-20080008965-A1 Ester compounds and their preparation, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-01-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080008965-A1 Ester compounds and their preparation, polymers, resist compositions and patterning process ESR1, H1-2, H1-4 CHRM2 351/4885CHRM1 204/4885CHRM4 738/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.