SCHEMBL12376762

SCHEMBL12376762

C=C(C)C(=O)Oc1ccc2cc(C(=O)OCCS(=O)(=O)O)ccc2c1

nearest known ligand 0.42

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.42
POLB P06746 1/20 0.38
APEX1 P27695 1/20 0.38
HTT P42858 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
HRH3 Q9Y5N1 2/20 0.38
FTO Q9C0B1 1/20 0.37
STS P08842 8/20 0.37
DRD3 P35462 1/20 0.37
HGFAC Q04756 1/20 0.36
KMT2A Q03164 1/20 0.34
ATM Q13315 1/20 0.34
KDM4E B2RXH2 1/20 0.34
ESR1 P03372 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12376766 0.89 ELANE (0.50) ELANEPOLBAPEX1HTTTDP1
SCHEMBL26312810 0.87 SERPINE1 (0.47) ELANETDP1KMT2AESR1
SCHEMBL16329474 0.82 ELANE (0.48) ELANETDP1STSKMT2AESR1
SCHEMBL26312823 0.81 POLB (0.49) ELANEPOLBAPEX1HTTTDP1
SCHEMBL26312929 0.81 ESR1 (0.39) ELANEPOLBAPEX1HTTTDP1
SCHEMBL10134932 0.81 ELANE (0.40) ELANEPOLBAPEX1HTTTDP1
SCHEMBL909434 0.80 POLB (0.47) ELANEPOLBAPEX1HTTTDP1
SCHEMBL11961792 0.79 ELANE (0.56) ELANETDP1HRH3FTODRD3
SCHEMBL26312594 0.78 HGFAC (0.54) ELANEHTTHGFACKMT2AATM
SCHEMBL11953044 0.78 HRH3 (0.54) POLBHTTTDP1HRH3DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8691490-B2 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-08 US disclosed
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-08-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110189607-A1 NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS RPS4Y1, ETV6, RPS4X ELANE 288/4885POLB 1380/4885APEX1 1814/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.