Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 4/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.37 |
| ▸ | ELANE | P08246 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | STS | P08842 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | MGLL | Q99685 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19756097 | 0.89 | ESR1 (0.41) | ESR1POLBKDM4EHDAC6TSHR | |
| SCHEMBL19756095 | 0.84 | KDM4E (0.50) | ESR1POLBKDM4EHDAC6TSHR | |
| SCHEMBL12376766 | 0.81 | ELANE (0.50) | ESR1POLBELANETSHRAPEX1 | |
| SCHEMBL12376762 | 0.81 | ELANE (0.42) | ESR1POLBKDM4EELANEAPEX1 | |
| SCHEMBL26312930 | 0.81 | — | — | |
| SCHEMBL26312810 | 0.80 | SERPINE1 (0.47) | ESR1ELANETSHRTDP1NPC1 | |
| SCHEMBL19756043 | 0.78 | ESR1 (0.45) | ESR1POLBKDM4EHDAC6TSHR | |
| SCHEMBL19756087 | 0.77 | ALDH1A1 (0.39) | ESR1POLBELANEHTTTDP1 | |
| SCHEMBL26273639 | 0.77 | ESR1 (0.34) | ESR1POLBKDM4EHDAC6ELANE | |
| SCHEMBL19756062 | 0.77 | ESR1 (0.49) | ESR1POLBKDM4EHDAC6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |